Patent
Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
Neil Richardson,Farid Askary,Stefano E. Concina,Kevin M. Monahan,David L. Adler +4 more
- 16 Jan 1998
63
TL;DR: In this article, a system and method for controlling electron exposure on image specimens by adjusting a raster scan area in between scan frame cycles is presented, where a small, zoomed-in, scan area and the surrounding area are flooded with positive charge for a number of frame cycles between scan frames to reduce the voltage differential between the scan and surrounding area, thereby reducing the positive charge buildup which tends to obscure small features in scanned images.
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Abstract: A system and method for controlling electron exposure on image specimens by adjusting a raster scan area in-between scan frame cycles. A small, zoomed-in, scan area and the surrounding area are flooded with positive charge for a number of frame cycles between scan frames to reduce the voltage differential between the scan area and surrounding area, thereby reducing the positive charge build-up which tends to obscure small features in scanned images. The peak current into a pixel element on the specimen is reduced by scanning the beam with a line period that is very short compared to regular video. Frames of image data may further be acquired non-sequentially, in arbitrarily programmable patterns. Alternatively, an inert gas can be injected into the scanning electron microscope at the point where the electron beam impinges the specimen to neutralize a charge build-up on the specimen by the ionization of the inert gas by the electron beam.
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Citations
Patent
Inspection system by charged particle beam and method of manufacturing devices using the system
Mamoru Nakasuji,Nobuharu Noji,Tohru Satake,Masahiro Hatakeyama,Toshifumi Kimba,Hiroshi Sobukawa,Shoji Yoshikawa,Takeshi Murakami,Kenji Watanabe,Tsutomu Karimata,Shin Oowada,Mutsumi Saito,Yuichiro Yamazaki,Takamitsu Nagai,Ichirota Nagahama +14 more
- 27 Jun 2001
TL;DR: In this paper, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical systems and introduced through a secondary optical systems to a detector.
196
Patent
Apparatus and method for examining specimen with a charged particle beam
Hans-Peter Feuerbaum,Dieter Winkler +1 more
- 02 Jul 1999
TL;DR: In this paper, an apparatus for examining a specimen with a beam of charged particles is described, where charging of the specimen is avoided or reduced by injecting inert gas onto the sample's surface.
114
Patent
Scanning electron microscope
Michio Hatano,Sukehiro Ito,Shinichi Tomita,Junichi Katane +3 more
- 15 Oct 1996
TL;DR: In this paper, an electron microscope with a pole piece electrode for accelerating primary electrons emitted at an electron source and an objective lens including the pole piece electrodes is presented, where an electrically and magnetically insulated gap is formed between the pole pieces electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector.
109
Patent
Voltage contrast method for semiconductor inspection using low voltage particle beam
Chiwoei Wayne Lo,Kenichi Kanai +1 more
- 08 Jan 1999
TL;DR: In this article, a charged particle beam inspection tool is used to detect defects in a patterned substrate by generating an image of a portion of the patterning substrate and comparing the image with a reference in order to identify any defects in the pattern.
76
Patent
Sterilization by low energy electron beam
George Wakalopulos,Eduardo R. Urgiles +1 more
- 17 Mar 1999
TL;DR: In this paper, a beam tube is used to generate the electron beam and the beam tube has a thin low energy absorbing window which allows relatively low energy beams to be used, minimizing damage to materials within the surface of the target objects.
66
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Patent
Inspection of multilayer ceramic circuit modules by electrical inspection of unfired green sheets
Arthur R. Zingher
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TL;DR: In this paper, a method of manufacturing packages for LSI chips starts with the usual steps of punching holes in green sheets, screening patterning paste (adapted to form cermet conductors or the like after firing), and inspecting the green sheets optically.
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Patent
Scanning electron microscope for visualization of wet samples
Alan C. Nelson
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TL;DR: In this article, a scanning electron microscope useful for obtaining microscopic data or images of wet specimens is provided with an electron source capable of emitting a beam of electrons; an electron optical vacuum column with means for focussing the beam of electron; means for scanning the focussed beam of the electrons across a specimen; a differentially pumped aperture column at attached to the electron OV column and having at least two walls perpendicular to the sides of the differentially-pumped aperture column defining a suitable series of pressure gradients, each wall having an aperture aligned to permit the beam
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