Patent
Scanning electron microscope
Michio Hatano,Sukehiro Ito,Shinichi Tomita,Junichi Katane +3 more
- 15 Oct 1996
109
TL;DR: In this paper, an electron microscope with a pole piece electrode for accelerating primary electrons emitted at an electron source and an objective lens including the pole piece electrodes is presented, where an electrically and magnetically insulated gap is formed between the pole pieces electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector.
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Abstract: The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the objective lens coil.
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Citations
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Patent
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TL;DR: In this article, a multi-beam apparatus for observing a sample with high resolution and high throughput is proposed, in which a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plurality of probe spots.
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Junichi Katane,Sukehiro Ito +1 more
- 20 Jan 2010
TL;DR: In this paper, a detachable diaphragm is used to separate a charged particle optical lens barrel from a space in which a sample is placed, wherein a detector for detecting secondary particles emitted from the sample as a consequence of being irradiated with the primary charged particle beams is disposed within the space of which the sample was placed.
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Electron detector including an intimately-coupled scintillator-photomultiplier combination, and electron microscope and x-ray detector employing same
Nicholas C. Barbi,Felip Lopour,Claudio Piedmonte,Richard B. Mott +3 more
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TL;DR: In this article, a charged particle beam device includes an electron source, an electron column, and an electron detector, each of which is connected face-to-face to an active light sensing surface of the SiPM.
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Yuusuke Tanba,Mitsugu Sato,Kaname Takahashi,Shunya Watanabe,Mine Nakagawa,Atsushi Muto,Akinari Morikawa +6 more
- 16 Dec 2014
TL;DR: In this paper, a charged particle beam device was proposed to detect secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, and bright field signals transmitted through a sample without being scattered within the sample.
37
References
Patent
Electron beam inspection system and method
Dan Meisburger,Alan D. Brodie,Curt H. Chadwick,Desai Anil,Hans Dohse,Emge Dennis,John D Greene,Ralph H. Johnson,Ling Ming-Yie,Mcmurtry John,Barry Becker,Paul Ray,Michael B. Robinson,Richard R. Simmons,Smith David E A,John C. Taylor,Lee H. Veneklasen,Dean Walters,Wieczorek Paul,Sam Wong,April Dutta,Lele Surendra,Rough Kirkwood,Henry Pearce-Percy,Jau Jack Y,Chun C. Lin,Hoi T. Nguyen,Oyang Yen-Jen,Hutcheson Timothy L,David J. Clark,Chung-Shih Pan,Chetana Bhaskar,Kirk Chris,Eric Munro +33 more
- 17 Mar 1994
TL;DR: In this article, a substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam, and an optical alignment system for initially aligning the substrate beneath the particle beam.
324
Low voltage scanning electron microscopy
TL;DR: In this paper, a state of charge balance is obtained to obviate imaging artifacts in low voltage scanning electron microscopy (LVSEM) using a field emission gun and a high performance lens.
290
Patent
Scanning electron microscope
Hattori Hideo
- 16 Jun 1986
TL;DR: In this article, negative voltage is applied to a grid stretched at a small distance from the under surface of the object lens of a scanning electron microscope so as to cover the under-surface.
270
Patent
Charged particle beam apparatus
Satoshi Tomimatsu,Sato Makoto,Atsushi Uemoto,Tatsuya Asahata,Yo Yamamoto +4 more
- 28 Aug 2015
TL;DR: In this article, a computer controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam.
256
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