Substrate exposure device and substrate exposure method

TL;DR: In this paper, the authors proposed a substrate exposure device for exposing a large thin substrate and capable of performing exposure with high accuracy without requiring a preliminary positioning mechanism which employs a system of pressing and deforming an end face of a substrate to impart load.

Abstract: PROBLEM TO BE SOLVED: To provide a substrate exposure device and a substrate exposure method suitable for exposing a large thin substrate and capable of performing exposure with high accuracy without requiring a preliminary positioning mechanism which employs a system of pressing and deforming an end face of a substrate to impart load. SOLUTION: The device is equipped with: an exposure optical system 22; an exposure table 16; an exposure frame 19 supporting a mask via a light transmitting plate; a first imaging means 27 imaging alignment marks M1, M2; a second imaging means 23 imaging at least three sides of the mask through the light transmitting plate; an illuminating means for the second imaging means; and a controlling means 25 which analyzes an image taken by the second imaging means, controls the exposure table to preliminarily position the substrate so that the substrate and the alignment marks 24 of the mask are within the view field of the first imaging means, as well as analyzes an image taken by the first imaging means and controls the exposure table to align the alignment mark of the substrate and the alignment mark of the mask. COPYRIGHT: (C)2007,JPO&INPIT