Patent
Model-based sraf insertion
Shumay Dou Shang,Lisa Swallow,Yuri Granik +2 more
- 25 Sep 2006
44
TL;DR: In this article, a system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features.
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Abstract: A system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features. Mask layout data for one or more subresolution assist features (SRAFs) is then defined to approximate one or more non¬ printing features of the optimized mask layout pattern.
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Citations
Patent
Integrated circuit layout design methodology with process variation bands
Juan Andres Torres Robles
- 06 May 2005
TL;DR: In this article, a system for analyzing IC layouts and designs by calculating variations of a number of objects to be created on a semiconductor wafer as a result of different process conditions is presented.
313
Patent
System and method for model-based sub-resolution assist feature generation
Jun Ye,Yu Cao,Hanying Feng +2 more
- 04 Jun 2007
TL;DR: In this paper, a model-based sub-resolution assist feature (MB-SRAF) is proposed, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window.
82
Patent
Contrast-based resolution enhancement for photolithographic processing
Juan Andres Torres Robles,Yuri Granik +1 more
- 10 Jul 2009
TL;DR: In contrast-based resolution enhancing technology (RET) as discussed by the authors, a distribution of contrast values for edge fragments in a design layout or portion thereof is determined based on a predefined threshold.
60
A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation
Xiaoqing Xu,Tetsuaki Matsunawa,Shigeki Nojima,Chikaaki Kodama,Toshiya Kotani,David Z. Pan +5 more
- 03 Apr 2016
TL;DR: This paper proposes the first machine learning based framework for fast yet consistent SRAF generation with high quality of results and demonstrates that, compared with commercial Calibre tool, this paper obtains 10X speed up and comparable performance in terms of edge placement error (EPE) and process variation (PV) band.
44
Patent
Methods for performing model-based lithography guided layout design
Jun Ye,Yu Cao,Hanying Feng +2 more
- 03 Jun 2008
TL;DR: In this article, a model-based sub-resolution assist feature (MB-SRAF) is proposed, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window.
40
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