Patent
Laser processing method and laser processing apparatus
Beng So Ryu,Hong-Jin Jung,Byong-Shik Lee,Bum-Joong Kim,Hyeon-Sam Jang,Hark-Yong Kim,Jong-Ho Kwak,Young-Yong Kim,Sun-Young Hong +8 more
- 28 Oct 2010
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TL;DR: In this article, a laser processing method of a sapphire substrate is described, where the laser beam is introduced into the substrate while avoiding an area where the stacked portions are formed on the substrate, so that the phase transformation area is formed within the substrate.
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Abstract: There is provided a laser processing method of a sapphire substrate including preparing a sapphire substrate on which plural stacked portions spaced from each other are formed, irradiating a short pulse laser beam from a laser light source, making the laser beam irradiated from the laser light source pass through a beam shaping module, adjusting a position of a light concentrating unit or the sapphire substrate such that the laser beam is concentrated to the inside of the sapphire substrate through the light concentrating unit, and forming a phase transformation area within the sapphire substrate by irradiating the laser beam into the sapphire substrate. The laser beam is introduced into the sapphire substrate while avoiding an area where the stacked portions are formed on the sapphire substrate, so that the phase transformation area is formed within the sapphire substrate.
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Citations
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TL;DR: In this paper, an evaluation jig and an evaluation method for a height position detection unit of a laser processing apparatus is presented. But, the evaluation method is limited to the detection of the z-axis direction of the back surface by irradiating the chip with laser beam for detecting the laser beam.
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TL;DR: In this paper, an apparatus for determining a substrate is provided, including a light emitting unit, a light receiving unit, memory unit, and a control unit, which is configured to emit light onto one surface of the substrate.
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Laser processing system and method for metallic surface
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- 01 May 2018
TL;DR: In this paper, a laser processing system and method for metallic surface is provided in disclosure, capable of improving the surface hardness of a metallic material surface, which is treated by scanning with a first laser having a pulse width of less than or equal to 100 microseconds to form microstructures.
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Device for determining substrate
Ki Taek Kim,Jung Hwa You +1 more
- 11 Feb 2015
TL;DR: In this paper, an apparatus for determining a substrate is provided, including a light emitting unit, a light receiving unit, memory unit, and a control unit, which is configured to emit light onto one surface of the substrate.
References
Patent
Laser processing method and laser processing apparatus
Fumitsugu Fukuyo,Kenshi Fukumitsu,Naoki Uchiyama,Toshimitsu Wakuda +3 more
- 15 Apr 2005
TL;DR: In this article, the authors present a method for cutting a work without producing a fusing and a cracking out of a predetermined cutting line on the surface of the work, where a pulse laser beam is radiated on the predetermined cut line, and a modified area is formed inside the work along the determined cut line by moving the condensed point along the predetermined cutoff point, whereby the work can be cut with a rather small force by starting from the modified area.
358
Patent
Method of cutting processed object
Fumitsugu Fukuyo,Kenshi Fukumitsu +1 more
- 11 Mar 2003
TL;DR: In this paper, the authors proposed a method of cutting a processed object capable of accurately cutting the processed object, comprising the steps of radiating laser beam (L) to the inside of the processed objects, such as a silicon wafer with a condensing point (P) focused to form reformed areas (7) in the processed device by absorbing multiple photons, forming cut start areas (8) eccentric from the centerline (CL) of the device in thickness direction to the surface (3) side of the object (1) along a predicted cut line, and pressing the
96
Patent
Laser processing apparatus
Akikazu Tanimoto,Keiichiro Sakato,Joji Iwamoto,Hiroshi Shirasu,Kiyoto Mashima +4 more
- 09 Jan 1987
TL;DR: In this article, the authors present a laser processing apparatus for projecting a spot of laser beam onto a portion of a microcircuit pattern on a semiconductor wafer, photographic mask or the like to cut the lead or anneal the limited area.
84
Patent
Laser processing method and laser processing device
Tetsuya Osajima,Ryuji Sugiura,Kazuhiro Atsumi +2 more
- 13 Sep 2006
TL;DR: In this article, a modified region 7 formed within a silicon wafer 11 has such a shape that the maximum length in the direction perpendicular to the line to cut 5 is shorter than the length in a direction parallel to the lines to cut 3, which can restrain twist hackles from occurring on cut surfaces.
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Patent
High speed quantum efficiency measurement apparatus utilizing solid state lightsource
Mark A. Arbore,David L. Klein,Leonid A. Vasilyev,John Schmidt,James E. Hudson,Gregory S. Horner +5 more
- 01 Mar 2010
TL;DR: In this article, a high-speed Quantum Efficiency (QE) measurement device that includes a device under test (DUT), at least one conditioned light source with a less than 50nm bandwidth, where a portion of the condition of the light source 5 is monitored is monitored.
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