Patent
High resolution plasma etch
Milos Toth,Noel Smith +1 more
- 21 Jun 2007
31
TL;DR: In this article, a method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process.
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Abstract: A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process.
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Citations
Patent
Charged particle beam masking for laser ablation micromachining
Marcus Straw,Milos Toth,Steven Randolph,Michael Lysaght,Mark W. Utlaut +4 more
- 26 Nov 2008
TL;DR: In this article, a combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation is used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser-ablation to preferably smaller than the diffraction limit of the machining laser.
23
Patent
Forming an image while milling a work piece
Jacob Simon Faber,Remco Geurts +1 more
- 26 Mar 2010
TL;DR: In this paper, the authors proposed an alternative solution to this problem, in which an instrument with only a focused ion beam (FIB) column is used to extract samples (lamellae) from semiconductor wafers.
22
Patent
Dual beam system
Tom Miller
- 27 May 2010
TL;DR: In this paper, a dual beam system was proposed for operation of a focused ion beam in the presence of a magnetic field from an ultra-high resolution electron lens, where the ion beam is deflected to compensate for the magnetic field.
21
Patent
High selectivity, low damage electron-beam delineation etch
Steven Randolph,Clive D. Chandler +1 more
- 30 Jan 2009
TL;DR: A method and apparatus for selective etching a substrate using a focused beam is described in this article, where multiple gases may be used that are involved in competing beam-induced and spontaneous reactions, with the result depending on the materials on the substrate.
20
Patent
Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
Sean Kellogg,Anthony Graupera,N. William Parker,Mark W. Utlaut,Andrew B. Wells,James B. Mcginn +5 more
- 21 Jun 2012
TL;DR: An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber as discussed by the authors.
17
References
Patent
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Bhardwaj Jyoti Kiron,Lea Leslie Michael +1 more
- 26 Apr 2000
TL;DR: In this article, a plasma processing apparatus is configured to alternately introduce an etch gas and a deposition gas into the chamber through the at least on gas inlet, and to strike a plasma into the etch gases and the deposition gas alternately introduced in the chamber.
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Patent
Plasma processing apparatus and method
Hideyuki Kazumi,Tsutomu Tetsuka,Ryoji Nishio,Masatsugu Arai,Ken Yoshioka,Tsunehiko Tsubone,Akira Doi,Manabu Edamura,Kenji Maeda,Saburo Kanai +9 more
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TL;DR: In this article, a Faraday shield is electrically isolated from the earth and the capacitance of the variable capacitor is determined to be such a value that the voltage at the two ends of the antenna may be equal in absolute values and inverted to reduce the partial removal of the wall after the plasma ignition.
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Patent
Surface cleaning and conditioning using hot neutral gas beam array
David C. Gray
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TL;DR: In this article, an apparatus for generating large arrays of directed beams containing thermally excited, electrically neutral gas species, including vibrationally excited molecules, free radicals, and atoms, is disclosed.
153
Patent
Plasma processing apparatus for large area ion irradiation
Akihisa Yoshida,Kentaro Setsune,Takashi Hirao +2 more
- 23 Sep 1987
TL;DR: In this paper, the magnetic field intensity was selected to be in the range from 25 gausses to 35 gusses, and the intensity of the applied magnetic field was set to be 1.5 times or more the applied RF power, which caused electron cyclotron resonance to occur at the frequency f of the RF power.
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Patent
Electron beam processing
Christian R. Musil,David J Casey,Thomas J. Gannon,Clive D. Chandler,Xiadong Da +4 more
- 27 Jul 2002
TL;DR: In this article, a method and apparatus for electron beam processing using an electron beam (101) activated gas to etch or deposit material was presented, particularly suitable for repairing defects in lithography masks.
138
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