Patent
Charge coupled device based system and method for inspecting and modifying images
Robert A. Duschl
- 14 Jun 1982
15
TL;DR: In this paper, a system for inspecting images projected onto a charge coupled device (CCD) compares the image cast onto the CCD by an object to be inspected with an optimum reference image to identify and locate faults in the object being inspected, or to modify the image to match the reference.
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Abstract: A system for inspecting images projected onto a charge coupled device (CCD) compares the image cast onto the CCD by an object to be inspected with an optimum reference image to identify and locate faults in the object being inspected, or to modify the image to match the reference.
read more
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Citations
Patent
Automated wafer defect inspection system and a process of performing such inspection
Jeffrey L. O'Dell,Thomas Verburgt,Mark Harless,Cory Watkins +3 more
- 15 Jul 1999
TL;DR: An automated defect inspection system has been invented and is used on patterned wafers, whole wafer, broken wafer, partial wafer and sawn wafer such as on film frames, JEDEC trays, Auer boats, die in gel or waffle packs, MCMs etc. as discussed by the authors.
235
Patent
System for automatic inspection of periodic patterns
John S. Batchelder,Raymond E Bonner,Byron Dom,Robert S. Jaffe +3 more
- 13 Mar 1987
TL;DR: In this article, a method and an apparatus for automatic inspection of periodic patterns typically found on patterned silicon wafers, printed circuit board, and the like is disclosed, which comprises an inspection algorithm of two parts: a low-level algorithm and a higher level algorithm which includes, therein the operation of the low level algorithm.
52
Patent
Substrate inspection method and apparatus
David Alumot,Gad Neumann,Rivka Sherman,Ehud Tirosh +3 more
- 23 Apr 1999
TL;DR: In this paper, a method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of examining with a high spatial resolution only the suspected locations for the presence or absence of a defect therein.
49
Patent
Inspection method and apparatus for a mask pattern used in semiconductor device fabrication
Kenichi Kobayashi
- 10 Sep 1984
TL;DR: An inspection method and apparatus for a mask pattern such as a reticle pattern used in the fabrication of a semiconductor device is disclosed in this paper, where the mask pattern is inspected by an imaging sensor mounted on a stage on which a fabricated object is also mounted.
49
Patent
Optical inspection apparatus for substrate defect detection
David Alumot,Gad Neumann,Rivka Sherman,Ehud Tirosh +3 more
- 15 Jan 2009
TL;DR: In this paper, a method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of examining with a high spatial resolution only the suspected locations for the presence or absence of a defect therein.
32
References
Patent
Automatic photomask inspection method and system
David A. Joseph,Peter G. Eldredge +1 more
- 31 Mar 1981
TL;DR: In this article, a method and apparatus for receiving two sets of digitized scan data from two optical detectors which simultaneously scan two supposedly identical portions of a photomask for comparing the two set of scan data to detect defects, and for evaluating the defect data to determine whether or not it represents real defect information or false defect information.
83
Patent
Similarity calculator comprising a buffer for a single input pattern feature vector to be pattern matched with reference patterns
Hiroaki Sakoe
- 27 May 1980
TL;DR: In this paper, a similarity measure set is defined for a set of fragmentary patterns A(u, m) defined by a common end point m and start points u's predetermined relative to the end-point m. Recurrence values are calculated according to a recurrence formula for each endpoint m, rather than for each fragmentary pattern set.
38
Patent
Method and apparatus for setup of inspection devices for glass bottles
John W. V. Miller
- 07 Nov 1980
TL;DR: In this paper, an apparatus for displaying an output of an inspection device for objects such as glass bottles and the like is connected to a source of data signals each proportional in magnitude to the amount of light received from an associated point on the object being inspected.
25
Patent
X-Ray diagnostic installation for providing subtraction images
Joerg Dipl Ing Haendle,Wolfgang Ing Grad Maass,H.D. Wolf +2 more
- 09 Apr 1981
TL;DR: In this paper, video images from a television pickup device corresponding to the x-ray images are supplied to an image store and to a difference stage for the purpose of providing subtraction images through difference formation from the stored and the current video signal.
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