Patent
Automatic matching method, computer-readable storage medium, automatic matching unit, and plasma processing apparatus
Ashida Mitsutoshi
- 04 Mar 2011
10
TL;DR: In this article, a controller for an automatic matching unit includes a first and a second matching control unit for respectively variably controlling the electrostatic capacitances of variable capacitors.
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Abstract: A controller 90 of an automatic matching unit includes a first and a second matching control unit 100, 102 for respectively variably controlling the electrostatic capacitances of a first and a second variable capacitors 80, 82 through a first and a second stepping motor 86, 88 such that a measured absolute value ZM m and a measured phase Zθ m of a load impedance obtained by an impedance measuring unit 84 become close to a predetermined reference absolute value ZM s and a predetermined reference phase Zθ s , respectively; and a gain control unit 112 The gain control unit 112 variably controls a proportional gain of at least one of the first and the second matching unit based on current electrostatic capacitances NC 1 and NC 2 of the first and the second variable capacitors 80, 82 obtained by a first and a second electrostatic capacitance monitoring unit 108, 110 , respectively
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Citations
Patent
Plasma Processing Apparatus
Manabu Edamura,Go Miya,Ken Yoshioka +2 more
- 20 May 2010
TL;DR: In this paper, a plasmas processing apparatus consisting of plural layers formed in stack one upon another on a semiconductor wafer placed on the sample holder located in the process chamber is etched with plasma generated by supplying high frequency power to the electrode disposed in a sample holder, and a power source for supplying power at different values to the ring-shaped electrode depending on the sorts of layers of the layer structure.
209
Patent
Control of etch rate using modeling, feedback and impedance match
Bradford J. Lyndaker,John C. Valcore,Alexei Marakhtanov,Seyed Jafar Jafarian-Tehrani,Chen Zhigang +4 more
- 10 Jan 2014
TL;DR: In this paper, a method for achieving an etch rate is described, which includes receiving a calculated variable associated with processing a work piece in a plasma chamber, propagating the variable through a model to generate a value of the calculated variable at an output of the model, identifying a calculated processing rate associated with the value, and identifying a pre-determined processing rate.
17
Patent
Inductively coupled plasma processing apparatus and control method thereof
Lim Jung Hwan
- 03 Dec 2014
TL;DR: In this article, an inductively coupled plasma processing apparatus and a control method for the operation of a convertible capacitor operating to control impedance in source coils by being arranged in each of the source coils is presented.
6
Patent
Plasma processing method
Ryosuke Niitsuma,Haruto Kanamori +1 more
- 21 Mar 2017
TL;DR: A plasma processing method uses a plasma processing apparatus including a processing chamber, a mounting table provided in the processing chamber and configured to support a target object, and a ceiling member made of silicon and provided above the mounting table as discussed by the authors.
5
Patent
Adaptive impedance matching method of power line
Zheng Zhen,Yu Huadong,Wang Haijun,Li Kunda +3 more
- 16 Jan 2018
TL;DR: In this paper, an adaptive impedance matching method for a power line, comprising the following steps that a no-load voltage of the power line is measured, data is recorded, a pure resistor is connected with the output line, an output voltage is calculated, and an output impedance of the line is calculated; a microprocessor detects whether the output impedance matches a load impedance of a communication system or not, the microprocessor does not carry out processing work if theoutput impedance of power line matches the load impedance, and the microprocessors calculates the data of an allocation capacitor if the
3
References
Patent
Methods for controlling an RF matching network
Arthur M. Howald
- 22 Dec 1998
Abstract: Disclosed are methods and devices for tuning an impedance matching network to a tune point where power reflection is at a minimum. The impedance matching network is coupled between an rf generator and a load to transmit rf power to the load. The impedance matching network includes a set of variable impedance elements. The method includes measuring a network impedance value of the impedance matching network including the load at current values of the variable impedance elements. The method further includes computing directions (i.e., increasing or decreasing) and relative rates of change for the variable impedance element values in response to the network impedance of the network such that the directions and relative rates of change for the variable impedance elements are adapted to change the reflected power in the direction of the most rapid decrease in reflected power. In addition, the method includes driving the variable impedance elements by adjusting the variable impedance elements in the computed directions by the computed relative rates of change such that the variable impedance elements are driven to new current values in the direction of the most rapid decrease in reflected power. The method also includes repeating operations (a) through (c) until a desired level of tuning precision is obtained at the current values of the variable impedance elements.
53
Patent
Automatic matching method and apparatus
John E. Brunner
- 13 Feb 1975
TL;DR: In this article, a high-Q load circuit is matched to a drive circuit with an L-type filter network including series and shunt reactances which are both either inductive or capacitive.
53
Patent
Plasma monitoring apparatus
Yasuhiro Nishimori,Michio Taniguchi,Kazuki Kondo +2 more
- 30 Sep 1998
TL;DR: In this article, an impedance matcher for monitoring a condition of plasma of a plasma load to which power is supplied from a high frequency power source through a high-frequency power source provides with a first-input impedance calculator for calculating an impedance as a first input impedance from a supply-side terminal of the matcher to the plasma load-side based on voltage, current and phase difference detected at the supply side terminal.
45
Patent
Rf match detector circuit with dual directional coupler
Bradley O. Stimson
- 04 Jul 1996
TL;DR: In this paper, a detector circuit is proposed for controlling an RF match circuit that receives an RF power signal from an RF source (10) and delivers the RF power signals to a load (20,25).
42
Patent
Inductively coupled source for deriving substantially uniform plasma flux
John Holland,Michael S. Barnes +1 more
- 10 Jun 1996
TL;DR: In this article, a planar coil exciting a plasma of an r.f. vacuum plasma processor for a workpiece processed surface in a chamber includes plural turns, and the coil, chamber and workpiece are arranged to produce in the chamber a magnetic flux having substantially greater density in peripheral portions of the coil and chamber than in the center portion of the chamber and coil so a substantially uniform plasma flux is incident on a processed surface of the workpiece.
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