The invention discloses a vectorgraph rasterizing method for a digital micromirror display. A general parallel computing technique of a GPU (Graphics Processing Unit) is utilized in the process of rastering the vectorgraph. The method comprises the following specific calculation steps: 1) zooming a coordinate unit of a vectorgraph point, and dynamically adjusting a vector point coordinate unit according to the differences of different LDI (Laser Direct Imaging) model grid precisions and the actual grid precisions; 2) rasterizing the edges of the vectorgraph; extracting pixel coordinates after each edge of the vectorgraph is rasterized, and filling all pixel points, and collecting all point pixel coordinates beyond an upper top point; and 3) carrying out resorting and pair filling on the pixel points obtained in step 2). According to the vectorgraph rasterizing method provided by the invention, the vectorgraph rasterizing process can be accelerated to realize rasterizing; furthermore, the vectorgraph data can be allowed to change temporarily when the capacity is guaranteed, therefore the method has an extensive practical value and a marketing situation, and the efficiency of the overall industry can be beneficially improved.

Vectorgraph rasterizing method for digital micromirror display

The invention discloses a laser direct writing data processing system. The laser direct writing data processing system comprises a host, a data processing module and a spatial light modulator (SLM), wherein the data processing module comprises a data receiving unit, a data processing unit, a data storage unit and a digital light processing (DLP) chipset, the DLP chipset comprises a DLP chip, a storage chip and an image transmission chip, the host and the data processing module are connected through a data transmission line, and the data processing module and the SLM are connected by a data wire. The invention also discloses a method for data processing by employing the data processing system. The laser direct writing data processing system is high in integration, concise in processing procedure, small in data transmission quantity among modules and low in cost and is convenient to maintain.

Laser direct writing data processing system and processing method

The invention discloses a method for carrying out splicing improvement by DMD (Digital Micromirror Device) triangular domains in tilting type scanning. In a write-through lithography machine which adopts a DMD mode for scanning, a concept of inter-strip splicing is brought due to a design of multiple optical heads. Due to various reasons including environment, mechanical vibration and the like, a traditional hard splicing mode is unstable and is poor in splicing quality, and phenomena including graphic misalignment, overlapping, tearing and the like are formed on a splicing position. In the tilting type scanning, the triangular domains on two sides of the DMD can be utilized to cause the boundary of each strip to form a gray level mode in a scanning process to improve in-field splicing and inter-field splicing. Gray level overlapping on the splicing position of the two strips can effectively weaken phenomena including splicing misalignment, overlapping, tearing and the like. Meanwhile, the practical scanning width of each strip can be increased, and the maximum plate making width of equipment is increased in a multiple-optical-head scanning process.

Method for carrying out splicing improvement by DMD (Digital Micromirror Device) triangular domains in tilting type scanning

The invention discloses a method for realizing data skew of a direct writing type lithography machine in an FPGA. The method comprises the following steps: extracting and grouping data according to a skew control character K, and performing the skew processing in Y-direction on the grouped data in parallel, and sending the data subjected to skew processing into a DDR2 for caching to carry out adjustment at different speeds, thereby avoiding data loss caused by unmatched speed; and finally, reading out the data in the DDR2 and performing the skew processing in X-direction to finish the skew processing of the data, wherein the processed data meets the demand of pattern generator receivable data and can be received by a pattern generator, and various pattern data in skew type exposure can be processed into pattern generator receivable data so as to implement correct data exposure. The pipeline operation of data skew is carried out by an RAM and a digital logic circuit in the FPGA, the data processing capacity is enhanced, and the data processing time is shortened.

Method for realizing data skew of direct writing type lithography machine in FPGA

The invention relates to a DMD action method for rolling grayscale lithography. A plurality of micro mirrors of DMD are adopted to expose single pixel of photoresist, movement of the DMD relative to the photoresist and the exposure action are carried out simultaneously; the invention discloses a specific action timing sequence of the DMD, a micro mirror status encoding method for DMD action, an updating method of a RAM (Random Access Memory) of a DMD status register, a data acquisition method and data size. By the DMD action method for rolling grayscale lithography, a lithography machine can perform photoetching continuously and the etched pattern is an 8-bit gray level pattern.

DMD action method for rolling grayscale lithography

The invention discloses a method for preparing skewed data in a field programmable gate array (FPGA) of a direct-writing type photoetching system. The method comprises the following steps of: storing gray-scale map data which are output by an upper detail drawing computer into a double-data rate synchronous dynamic random access memory (DDR) in a scanning line format; after the number of lines of the gray-scale map data reaches a certain number, reading data from the DDR by a control module in the FPGA at an interval which is formed according to a skew factor N, storing the data into a random access memory (RAM) of the FPGA through a data bus, and buffering the data; reading the skewed data from the RAM of the FPGA by the control module in the FPGA in a format which is formed according to the skew factor N, inputting the skewed data into a conversion matrix, converting gray scale, and extracting scanning data; and storing the converted data into the RAM of the FPGA through the data bus, buffering the data, and writing the data into a digital micro-mirror device (DMD) scanning display data area of the DDR in a subsequent operation period. The method has the advantages that bitmap data is not required to be processed by the upper detail drawing computer, the detail drawing data processing capacity is improved, the bit data processing capacity of the FPGA is embodied, skew scanning speed is increased, and the utilization rate of resources of the FPGA is high.

Method for preparing skewed data in field programmable gate array (FPGA) of direct-writing type photoetching system

The invention discloses an oblique scan display method in a direct writing photoetching system. N2 rows of data are combined and stored in a memory in sequence according to an obliquity factor N and on the basis of left-justified N rows and N lines of pixel data, and an FPGA (field programmable gate array) selects the data in the corresponding rows in sequence according to the platform motion to a DMD (digital micro-mirror display) to display. According to the invention, the data are stored in a DDR2 (double data rate 2), the DMD is controlled by the FPGA, and the oblique scan display is a method for updating an image according to the obliquity factor and a platform scanning manner, so that the operating mode of the FPGA can be conveniently designed and optimized, and the data reading efficiency of the DDR2 can be improved.

Oblique scan display method in direct writing photoetching system

The invention discloses a compression method for image data string in a direct writing lithography system. Compressed data uses bytes as unit and combines into different data structures in different express bytes; and structural bit data is, from high to low, indicating bit and image point data, or indicating bit, expression bit and count value, or indicating bit, expression bit and illustration data. The compression method of the invention is simple and fast; compressed data satisfies reverse non-return-to-zero (NRZI) coding requirements in transmission, without inserting data bits or wasting bandwidth; and compressed data can utilize correlation in the image to increase compression ratio.

Compression method for image data string in direct writing lithography system

The invention discloses a tilt-scanned image data compression method in a direct-write lithography system. According to the invention, N*N bitmap data is read each time; characters are adopted as units, and N lines of bitmap data are compressed at a same time. The compressed data are sequentially line-starting mark, quantity after compression, and bitmap data or bitmap compression data. The bitmap compression data and the starting mark are non-appearing N*N bitmap. The compression method provided by the invention is simple and fast. The data obtained after data compression can be transmitted with a line manner, and the speed is easy to control.

Tilt-scanned image data compression method in direct-write lithography system

Compression method for image gradation data in direct writing lithography system

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