A display apparatus includes a substrate and a plurality of pixels disposed on the substrate. Each pixel includes a gate electrode disposed on the substrate, a gate dielectric layer disposed on the substrate and the gate electrode, an oxide semiconductor pattern disposed on the gate dielectric layer, a first insulating pattern disposed on the oxide semiconductor pattern that overlaps the gate electrode, a second insulating pattern disposed on the oxide semiconductor pattern and spaced apart from the first insulating pattern, source and drain electrodes spaced apart from each other on the oxide semiconductor pattern, a pixel electrode pattern disposed on the second insulating pattern to make contact with the source electrode, and a channel area defined where the oxide semiconductor pattern overlaps the gate electrode. A high carrier mobility channel is formed in the channel area when a turn-on voltage is applied to the gate electrode.

Display apparatus and method of manufacturing the same

A display unit comprising an organic layer between a light-emitting section portion of a first electrode layer and a light-emitting section portion of a second electrode layer. Light is emissible from within the organic layer. An aperture-defining insulating film is between a contact section of the first electrode layer and a gap section portion of the second electrode layer. The thickness of the gap section portion of the second electrode layer is greater than the thickness of the light-emitting section portion of the second electrode layer.

Display unit and electronic apparatus

PROBLEM TO BE SOLVED: To provide a display device having enhanced video quality, and a method for manufacturing the sameSOLUTION: In the display device having a plurality of pixels, each of the pixels include a gate electrode provided on a first insulating substrate, a gate insulating film which covers the gate electrode and is provided on the first insulating substrate, a semiconductor pattern arranged on the gate insulating film so as to overlap the gate electrode, a source electrode and a drain electrode which are provided on the semiconductor pattern so as to be separated from each other, a transparent pixel electrode which is arranged on the gate insulating film and of which a part is brought into contact with the drain electrode, a protection layer formed on the transparent pixel electrode, and a common electrode which is provided in any one of the first insulating substrate and the second insulating electrode opposing to the first insulating substrate and forms an electric field together with the pixel electrode

Display device and method for manufacturing the same

PROBLEM TO BE SOLVED: To provide a wire grid polarizing plate which does not have wavelength dependency for over a wide band of a visible light area and makes excellent polarizing degree and transmissivity compatible. SOLUTION: The wire grid polarizing plate includes: a resin substrate 1 which has rugged grids having grid projected parts 1a extending in the specific direction and in which the shape of a recessed part 1b between the grid projected parts 1a in a cross-section perpendicular to the specific direction is approximately in the parabolic shape; a dielectric layer 2 covered on the grid projected parts 1a; and a metal wire 3 provided on the dielectric layer 2; wherein the metal wire 3 exists at least at an upper part rather than the top of the grid recessed part 1a coated by the dielectric layer 2, passes through the top of the wire 3 in the cross-section, and a metal wire axis A along the vertical arrangement direction of the wire 3 and a grid projected part axis B which passes through the top of the grid projected part 1a in the cross-section and along the vertical arrangement direction of the grid projected part 1a are shifted. COPYRIGHT: (C)2010,JPO&INPIT

Wire grid polarizing plate

A method for making a conductive network of sintered silver comprises preparing a conductive ink comprising a silver compound and a binder; depositing the conductive ink on a substrate and applying an external energy source to the deposited conductive ink to dry the ink; and applying an external energy source to the dried ink to decompose the ink to elemental silver and to sinter the elemental silver into a conductive network.

Conductive material and process

PROBLEM TO BE SOLVED: To provide a novel transparent conductive film capable of sintering at a relatively low temperature and having a high transmission rate and a low resistance, and to provide a manufacturing method thereof. SOLUTION: The novel transparent conductive film has at least a first layer including one kind or more of metal oxide particles selected from either of In, Sn and Zn, the novel transparent conductive film is a polycrystalline film wherein the oxide particles forming the first layer are formed with oxide large particles with a diameter from 50 nm or more and less than 200 nm, and oxide fine particles with a diameter from 5 nm or more and less than 10 nm having an amount for covering 20-30% of the whole surface area of the oxide large particles. In the manufacturing method for the oxide transparent conductor film, a dispersed liquid including oxide fine particles containing of at least one kind or more of metal elements selected from either of In, Sn and Zn is applied on a substrate, the applied dispersed liquid on the substrate is retained at temperature of 25-250°C, and the transparent conductive film is formed by irradiating an ultraviolet ray pulse laser beam under a non-oxidizing atmosphere after irradiating with an ultraviolet ray lamp or without irradiating with the ultraviolet ray lamp. COPYRIGHT: (C)2010,JPO&INPIT

Forming method for transparent conductive film

PROBLEM TO BE SOLVED: To provide a cathode catalyst for a solid polymer fuel cell having an excellent performance in oxygen reduction performance and durability under a high temperature being an actual operation temperature. SOLUTION: The cathode catalyst for the solid polymer fuel cell is obtained by applying a first stage calcination at 300°C-600°C and then by applying a second stage calcination after raising continuously up to 700°C-1,000°C on (i) a mixture X consisting of one kind or more of metal M selected from Pd or Pt and a metal A and/or (one kind or more of metal A' selected from a hydroxide, peroxide, and oxide of the metal A), (ii) a mixture Y consisting of one kind or more of metal M selected from Pd or Pt and a metal A other than the metal M and/or (one kind or more of metal A' selected from a hydroxide, peroxide, and oxide of the metal A), and a metal B other than the metal M, A and/or (one kind or more of metal B' selected from a hydroxide, peroxide, and oxide of the metal B), and (iii) a composition containing at least one kind or more selected from an alloy as expressed by a formula (1): M x A y B z (wherein, 0<x<1, 0<y<1, 0≤z<1, M shows Pd and/or Pt, A and B shows a mutually different metal other than M), an organic compound containing nitrogen atom having an unshared electron pair, and carbon powder. COPYRIGHT: (C)2009,JPO&INPIT

Electrode catalyst for fuel cell

PROBLEM TO BE SOLVED: To eliminate the need for residual film removal, or reduce inconvenience caused by residual film removal, and form a desired fine uneven pattern on the surface of a base material.SOLUTION: A second resist layer (307) is filled into a recessed portion (304) of a mold (303) having a fine uneven structure (306) on a surface, and the surface of the mold (303) is pressed against the surface of a first resist layer (302) on a base material (301). In this state, the first resist layer (302) and the second resist layer (307) are chemically bonded by thermal energy. The first resist layer (302) is etched by using the second resist layer (307) as a mask, and a mask layer (308) made up of the second resist layer/the first resist layer is formed on the surface of the base material (301). The base material (301) is etched by using the mask layer (308) to obtain a base material with a fine uneven pattern.

Method of manufacturing base material with fine uneven pattern

PROBLEM TO BE SOLVED: To provide a practical mold with outstanding mold release properties and durability with the easy and feasible setting thereof by forming a fluororesin copolymer layer which is soluble in an organic solvent and thermally plastic on the surface of a matrix. SOLUTION: A fluororesin copolymer is dissolved in an organic solvent to make it a uniform liquid. This liquid is imparted to the surface of a mold matrix to be formed into a coating film and thereby a thin film-like uniform layer of the fluororesin copolymer is formed. In this case, the fluororesin copolymer is soluble in the organic solvent and is thermally plastic, and is manufactured by copolymerizing a thermoplastic fluororesin component and another thermoplastic resin component. The other thermoplastic resin component to be used is acrylic or vinyl ether or the like. In addition, the fluororesin copolymer layer is structured in such a manner that for example, the contact angle of water is 80 deg. or more, and the molding endurance frequency at 5.0 kg/cm or less pressure is about 3,000 times or more. Further, the build-up of the fluororesin copolymer on the surface of the mold matrix is about 50-500 g/m .

Mold and inorganic molding

PROBLEM TO BE SOLVED: To provide an organic EL device in which angular dependence and color shift are suppressed, specifically are suppressed as an angle increases, and which can prolong a life thereof.SOLUTION: In an organic EL device, a light extracting body (100) includes a nano-order uneven structure (101a) including a plurality of projecting portions (101b) independent each other. An uneven structure layer (101) having a first refractive index (n1), a light extracting layer (102) having a second refractive index (n2), a planarization layer (103) having a third refractive index (n3), and the uneven structure (101a) satisfy predetermined conditions. The first to third refractive indexes (n1-n3) satisfy one of the expressions (5)-(7). Expression (5) n2>n3≥n1 and (n2-n3)≥0.1 Expression (6) n3>n2>n1 and (n3-n2)≥0.1 Expression (7) n3≥n1>n2 and (n1-n2)≥0.1.

Organic el device

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