An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.

Exposure method and apparatus

Micro and Nano Machining by Electro-Physical and Chemical Processes

An ultrasonic system useful for providing imaging, therapy and temperature monitoring generally comprises an acoustic transducer assembly configured to enable the ultrasound system to perform the imaging, therapy and temperature monitoring functions. The acoustic transducer assembly comprises a single transducer that is operatively connected to an imaging subsystem, a therapy subsystem and a temperature monitoring subsystem. The ultrasound system may also include a display for imaging and temperature monitoring functions. An exemplary single transducer is configured such that when connected to the subsystems, the imaging subsystem can generate an image of a treatment region on the display, the therapy subsystem can generate high power acoustic energy to heat the treatment region, and the temperature monitoring subsystem can map and monitor the temperature of the treatment region and display the temperature on the display, all through the use of the single transducer. Additionally, the acoustic transducer assembly can be configured to provide three-dimensional imaging, temperature monitoring or therapeutic heating through the use of adaptive algorithms and/or rotational or translational movement. Moreover, a plurality of the exemplary single transducers can be provided to facilitate enhanced treatment capabilities.

Imaging, therapy, and temperature monitoring ultrasonic system

A non-invasive visual imaging system is provided, wherein the imaging system procures an image of a transducer position during diagnostic or therapeutic treatment. In addition, the system suitably provides for the transducer to capture patient information, such as acoustic, temperature, or ultrasonic images. For example, an ultrasonic image captured by the transducer can be correlated, fused or otherwise combined with the corresponding positional transducer image, such that the corresponding images represent not only the location of the transducer with respect to the patient, but also the ultrasonic image of the region of interest being scanned. Further, a system is provided wherein the information relating to the transducer position on a single patient may be used to capture similar imaging planes on the same patient, or with subsequent patients. Moreover, the imaging information can be effectively utilized as a training tool for medical practitioners.

Visual imaging system for ultrasonic probe

An apparatus and method for monitoring the inclination of a wafer residing within a pocket of a semiconductor processing chamber susceptor. The apparatus of the present invention includes a laser beam source that is positioned to direct a laser beam onto the top surface of a wafer that has been positioned within a susceptor pocket. A laser receiver is positioned to detect the laser beam after it has been reflected off the surface of the wafer. The laser receiver emits an output signal to a visual or audible indicator that indicates whether or not the wafer is properly positioned within the pocket of the susceptor.

Wafer out-of-pocket detection method

In a mechanically scanned ultrasonic probe, an ultrasonic transducer (4) is swingably mounted on a drive shaft (9,9a,9b; 46; 64,67; 85) which is given a swinging transversal movement and a reciprocating longitudinal movement. The transducer emits an acoustic beam which is steered in a raster format in response to the swing and reciprocating motions. Echos returning from objects contain diagnostic data of a three-dimensional space. All the components are encased in a toothbrush-like housing having a head portion (3a), an intermediate portion (3b) and a hand-grip portion (2). The dual motions are provided by a drive mechanism accommodated in the hand-grip portion and the transducer is accommodated in the head portion. The drive shaft extends through the intermediate portion.

Ultrasonic probe having dual-motion transducer

On a substrate are configured piezoelectric elements composed of a mirror device, piezoelectric thin films, electrodes, and elastic members, and application of a voltage to the electrodes causes flexure deformation in the piezoelectric thin films, so that the mirror device is actuated. A plurality of the piezoelectric elements are arranged in parallel with a longitudinal direction thereof, and torsion springs are provided so as to extend in a direction orthogonal to the longitudinal direction and so as to hold the mirror device in connection with the substrate. The mirror device is connected to the piezoelectric elements through strain absorbers. In such a configuration, the torsion springs serve as a rotation axis, and the mirror device is inclined about the rotation axis.

Optical switch and production method therefor, information transmission device using it

A first reticle (2) is located at an object position of a lens (1) to be evaluated. The first reticle is formed with a first diffraction grating. A stage (3) supports the first reticle. A coherent light source (4) illuminates a whole region of the first diffraction grating. A spatial filter (9) blocks a 0-order component of diffraction light from the first diffraction grating. A second reticle (11) is located at an image position of the lens and is formed with a second diffraction grating. A stage (12) moves the second reticle within a projection range of the lens (1). Interference fringes are formed on the second reticle by re-diffraction by the lens. Moire fringes are caused by the second diffraction grating and the interference fringes. The moire fringes are observed.

Apparatus for evaluating a lens

In a video signal processing apparatus, a contour signal of a moving object is separated from static background video image signals The video signal photographed by a television camera is converted into a binary contour signal One converted signal obtained at a certain time and another converted signal obtained at another time are processed to extract a contour signal of the moving object The extracted contour signal of the moving object is supplied to a circuit which controls panning and/or tilting of the television camera

Video signal processing apparatus for separating an image of a moving object from video signals

A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

Apparatus for controlling relation in position between a photomask and a wafer

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