A method forms a representative image from a crossed grating fringe pattern interferogram of an object from an interferometer. The method determines a plurality of spectral lobes from the interferogram and selects from the plurality of determined lobes, two substantially orthogonal sidelobes. The selected sidelobes represent spatial differential phase information of the interferogram. The method applies an inverse Riesz transform to the spatial differential phase information of the selected sidelobes to form a transformed differential phase image, and forms from the transformed differential phase image, a representative image emphasising high frequency detail information of the object.

Combining differential images by inverse riesz transformation

Illumination phase controls that provide precise and fast phase control of structured illumination patterns used in structure illumination microscopy are described. A coherent light source is used to generate a beam of coherent light that is split into at least three coherent beams of light. In one aspect, an illumination phase control is composed of at least one pair of rotatable windows to apply at least one phase shift to at least one of the beams. An objective lens is to receive the beams and focus the at least three beams to form an interference pattern. The phase control can be used to change the position of the interference pattern by changing the at least one phase shift applied to the at least one beam.

Systems and methods for illumination phase control in fluorescence microscopy

The invention relates to a novel optical lens measuring method which comprises the following steps: (1) establishing a lens measuring system consisting of a display and a CCD camera; (2) displaying phase shifting strips through the display, and enabling the camera to acquire strips of a display screen without a lens to be measured and with the lens to be measured in a position 1 and a position 2;(3) calculating primary phase distribution of the strips by using a four-step phase shifting method and a rhombus seed algorithm, performing system calibration through a phase without the lens to be measured, fitting a planar equation of the display screen in the two positions, calculating a rotational matrix R and a translation vector T from a screen physical coordinate system to a camera coordinate system, and further calculating the wave front slopes of the position of the lens and each point on the lens; (4) performing integration on the wave front slopes by using a Poisson reconstructionmethod so as to obtain wave front distribution of the lens to be measured; (5) calculating a spherical lens degree and astigmatic power distribution of the whole surface of the lens by using a dioptercalculation model according to the wave front distribution of the lens. By adopting the method, free-form surface lenses with relatively large curvature variations can be measured, and high resolution ratios and rapid measurement speeds can be achieved.

Novel optical lens measuring method

The present invention discloses various system and process embodiments where wafer-metrology and direct measurements of the lithography apparatus characteristics are combined to achieve temporal drift reduction in a lithography apparatus/process using a simulation model. The simulation model may have sub-components. For example, a sub-model may represent a first set of optical conditions, and another sub-model may represent a second set of optical conditions. The first set of optical conditions may be a standard set of illumination conditions, and the second set may be a custom set of illumination conditions. Using the inter-relationship of the sub-models, stability control under custom illumination condition can be achieved faster without wafer metrology.

System and method to ensure source and image stability

The invention relates to a multiparameter digitlization measuring instrument of visible near infrared laser beam. The instrument comprises a computer, analysis software, a coupling device, a working distance program control adjusting device, an attenuating device, a light splitting device, a light source indicating device, a protective cover and a pedestal. In the invention, the light source indicating device, the light splitting device, and a self-adjusting device are coaxial with an optical system of a system to be tested, provide a finite or infinite target to the system to be tested, and serve as an indication. When a cross graduation of the light source indicating device coincides with the cross graduation of the system to be tested, the optical axis of the measuring instrument coincides with the optical axis of the system under test; a CCD (charge coupled device) camera arranged on an object lens focal plane records changes of a light spot; and a computer program is used to obtain such parameters of the system to be tested as the laser light spot size, laser divergence angle, light intensity distribution, and light spot walking momentum.

Multiparameter digitlization measuring instrument of visible near infrared laser beam

PROBLEM TO BE SOLVED: To measure precisely the optical property of an optical system, even when the contour of a light intensity distribution to be measured regarding the optical system of a measuring object is not circular. SOLUTION: In a method to measure a numerical aperture of projection optical system, a light intensity distribution is measured in a measuring region 34 conjugated with the pupil plane of the projection optical system, the light intensity distribution is divided into light intensity distributions within a plurality of regions Ai around the virtual center PC of the measured light intensity distribution for every predetermined angle dθ, the contour is found from each difference of radial direction of the light intensity distributions within the plurality of regions Ai, and the numerical aperture is found based on the found plurality of contours. COPYRIGHT: (C)2011,JPO&INPIT

Optical characteristic measuring method and device, as well as exposure method and device

PROBLEM TO BE SOLVED: To efficiently and accurately reduce information on an image of the wave front of object light having passed through a test optical system. SOLUTION: This method for reducing the image 23 of the wave front of the object light on the basis of the interference fringes between the object light and reference light includes: a stage for finding the distribution of a phase ϕ in a plurality of pixels P(i, j) from the intensity distribution of the interference fringes; a stage for finding values of cos ϕ and sin ϕ of a phase ϕ in each pixel P(i, j); a stage for reducing the plurality of pixels P(i, j) to a plurality of pixels Q(q, r) smaller in number to which values of cos ϕ and sin ϕ are assigned, respectively; and a stage for finding a phase from the values of cos ϕ and sin ϕ at each pixel Q(q, r). COPYRIGHT: (C)2010,JPO&INPIT

Image reduction method and image reduction program

PROBLEM TO BE SOLVED: To correctly evaluate the state of the wave front of light having passed through a test optical system, even when the wave front is divided into a plurality of areas. SOLUTION: In a wave front evaluation method for evaluating the wave front of object light ILO on the basis of the interference fringes IF between the object light ILO and reference light ILR: from the intensity distribution of the interference fringes IF, a first phase distribution is found; from the first phase distribution, a second phase distribution of the difference between wave fronts in the x and y directions is found; an operation expression containing the difference between the Zernike polynomials corresponding to the second phase distribution is found, by using a Zernike coefficient on the occasion of development of the wave front of the object light ILO by the use of Zernike polynomials; and by using the second phase distribution and the operation expression, the value of the Zernike coefficient is found. COPYRIGHT: (C)2010,JPO&INPIT

Method and program for evaluating wave front

PROBLEM TO BE SOLVED: To evaluate the state of the wave front of light passing an inspecting object optical system at an interval finer than shear amount when shearing interference is used SOLUTION: In this wave front evaluation method, the wave front of object light ILO is evaluated based on the interference fringes with the object light ILO and a shear light ILS This wave front evaluation method includes determining a first phase distribution based on intensity distribution of the interference fringes of shearing interference of two orthogonal directions, determining a second phase distribution of differential wave front of two orthogonal directions based on the first phase distribution, determining an arithmetic expression corresponding to the second phase distribution using phase values at a plurality of lattice points arranged along the two directions of the wave front of the object light ILO, and determining the phase value at the plurality of lattice points using the second phase distribution and the arithmetic expression COPYRIGHT: (C)2010,JPO&INPIT

Wave front evaluation method and program for wave front evaluation

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Optical characteristic measuring method and device, as well as exposure method and device

Image reduction method and image reduction program

Method and program for evaluating wave front

Wave front evaluation method and program for wave front evaluation