Klaus Wittmaack
IBM
195 Papers
2.7K Citations
Klaus Wittmaack is an academic researcher from IBM. The author has contributed to research in topics: Ion & Secondary ion mass spectrometry. The author has an hindex of 40, co-authored 195 publications. Previous affiliations of Klaus Wittmaack include Ludwig Maximilian University of Munich & Technical University of Berlin.
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Papers
Beam-induced broadening effects in sputter depth profiling
TL;DR: In this paper, the broadening effects encountered in sputter depth profiling are reviewed in some detail, focusing on cases where beam-induced microtopographical changes are of negligible importance.
156
Oxygen-concentration dependence of secondary ion yield enhancement
TL;DR: In this article, the effect of implanted oxygen on secondary ion intensities has been investigated quantitatively for the first time, and it was found that at low oxygen concentrations, c o ⩽ 3 at %, the oxygen-induced signals are directly proportional to c O, whereas above that limit a power law is observed (power up to 3.7).
134
Effect of surface roughening on secondary ion yields and erosion rates of silicon subject to oblique oxygen bombardment
TL;DR: In this paper, the effect of secondary ion mass spectrometers on ripple formation on silicon surfaces subject to oblique bombardment with O+2 ions was studied using a versatile ion microprobe which allows the angle of beam incidence and the impact energy to be varied independently.
116
Secondary ion mass spectrometry as a means of surface analysis
TL;DR: In this paper, the authors reviewed the current state of secondary ion mass spectrometry (SIMS) applied to the investigation of surfaces and discussed the basic phenomena involved (ion penetration and reflection, ion ranges and sputtering).
109
An overview on bioaerosols viewed by scanning electron microscopy.
TL;DR: Bioaerosols suspended in ambient air were collected with single-stage impactors at a semiurban site in southern Germany during late summer and early autumn and characterized by scanning electron microscopy (SEM).
106