Disclosed herein is a composite core die (100) comprising a reusable core die; and a disposable core die (10); wherein the disposable core die (10) is in physical communication with the reusable core die; and further wherein surfaces of communication between the disposable core die (10) and the reusable core die serve as barriers to prevent the leakage of a slurry that is disposed in the composite core die (100).

Composite core die, methods of manufacture thereof and articles manufactured therefrom

PROBLEM TO BE SOLVED: To provide a method for manufacturing a design model, which improves efficiency in a molding work, and to provide a spray coating material and a putty material for a mounding process preferably used in the above manufacturing method. SOLUTION: The method for manufacturing a design model comprises: a lamination step of laminating a foamed polystyrene block on a model outline shape to form an outline structure; a rough cutting step of cutting the outline structure into the model outline shape by NC machining to form a model base; a coating step of coating the surface of the model base with a solvent-free two-liquid quick curable urethane resin liquid by using a double-head gun spray coating machine; a mounding step of mounding a solvent-free two-liquid curable urethane mounding resin by using an automatic mix-discharge and automatic mounding machine onto the surface of the cured resin liquid; a finishing step of cutting the cured resin by NC machining; and a coating step of spraying a coating material onto the surface of the finished cured resin. COPYRIGHT: (C)2010,JPO&INPIT

Method for manufacturing design model, solvent-free two-liquid quick curable urethane resin liquid for spray coating material, and solvent-free two-liquid reaction curable urethane resin putty material for mounding process

A process for producing a resin model for use in lost wax precision casting, comprising at least a hardened resin layer forming step of injecting two-pack reaction hardening type urethane resin solution (A) of 1 to 3 min pot life, through casting port (4) of resin model forming mold (2) furnished with internal space (3) whose configuration is identical with that of product, into the internal space (3) in a volume amounting to 5 to 20% of the volume of the internal space (3), closing the casting port (4) and rotating the resin model forming mold (2) so that layer (11) of two-pack reaction hardening type urethane resin hardened is formed on the inside wall of the resin model forming mold (2); a resin model forming step of repeating the hardened resin layer forming step 3 to 6 times at intervals of 3 to 5 min so as to effect laminating of hardened resin layers (11), thereby obtaining resin model (12) having internal space (30) provided at a core region thereof; and a demolding step of demolding the resin model (12) from the resin model forming mold (2).

Process for producing resin model and process of lost wax precision casting with the resin model

This film-forming method involves disposing, on a reverse surface side of a target, a plurality of magnetic circuits configured so as to be able to move in a first direction parallel to the reverse surface of the target, and disposing a substrate on a front surface side of the target and performing film-forming by magnetron sputtering, wherein: each of the magnetic circuits is provided with an annular magnet and a central magnet that is disposed on the inner side of the annular magnet, the polarity of a surface opposing the reverse surface of the target being different from the polarity of the annular magnet; a magnetic field, where a perpendicular component of the magnetic field generated from the magnetic circuits relative to the front surface of the substrate is 0, is formed in an annular shape on the front surface side of the target and between the annular magnets and the central magnets; and in the first direction, the magnetic circuits swing with a first movement distance L1 and a second movement distance L2 different from the first movement distance L1, the proportion of L1 and L2 per unit time where the magnetic circuits are moving being controlled.

Film forming method and film forming device

A magnetron sputtering source for sputtering a target includes a magnetically permeable material yoke member and a first magnet positioned on said yoke member and having a north-south magnetic orientation that is perpendicular to the yoke member A second magnet positioned on the yoke member spaced apart from the first magnet and having a north-south magnetic orientation that is perpendicular to the yoke member and opposite the magnetic orientation of the first magnet The resulting magnetron sputtering source produces a magnetic field having magnetic flux lines that define a sputtering region adjacent the front surface of the target and within the target body The magnetic flux lines have substantial perpendicular components to the yoke member adjacent the front surface of the target and within the target body and having generally uniform magnetic flux density adjacent the front surface of the target and within the target body

Magnetron sputtering source for insulating target materials

PROBLEM TO BE SOLVED: To solve the problems of a conventional wax pattern and to provide a resin pattern having good losing characteristics and high forming precision. SOLUTION: In precision casting with a lost wax method, the resin pattern is used instead of the wax pattern. This resin pattern is formed by hardening reaction hardening resin liquid (B) containing 10 to 40 wt.% liquid plasticizer (A) within 5 min pot life at a room temperature. Further, the hardness at 80°C is in a range of 30 to 60 Shore D hardness. COPYRIGHT: (C)2003,JPO

Precision casting method and precision cast product produced with this precision casting method

PROBLEM TO BE SOLVED: To provide a method for manufacturing a resin pattern for lost wax precision casting method and this casting method with which various kinds of problems caused by the wax pattern are dissolved. SOLUTION: This method for manufacturing the resin pattern, is contained of at least, a hardened layer forming process, in which two-liquid reaction hardening type urethane resin liquid (A) having only 1 to 3 min useable time is poured into a cavity 3 by the volume amount corresponding to 5 to 20% of the cavity 3 through a pouring hole 4 of a mold 2 for forming the resin pattern demarcating the cavity 3 having the same shape as a product and the mold 2 is rotated after sealing the pouring hole 4 to form the two-liquid reaction hardening type urethane resin hardened layer 11 in the inner wall of the mold 2, a resin pattern forming process, in which the hardened layer 11 is laminated by repeating the above hardened layer forming processes at 3 to 6 times in each 3 to 5 min to form the resin pattern 12 having the inner space 30 at the central portion, and a mold removing process, in which the resin pattern 12 is removed from the mold 2 for forming the resin pattern. COPYRIGHT: (C)2004,JPO

Method for manufacturing resin pattern and lost wax precision casting method using this resin pattern

The present invention provides a sputtering device and a magnet unit in which sufficient leakage flux density is obtained on the surface of a target when the width of the magnet unit has been reduced. This sputtering device is provided with a target holder and a rectangular magnet unit having a long side and a short side. The magnet unit has: a first magnet; a second magnet disposed at the periphery of the first magnet and magnetized in a reverse direction that is different from the magnetized direction of the first magnet; and a third magnet magnetized in the short-side direction in at least a position centered between the first magnet and the second magnet and in a portion of the area between the first magnet and the second magnet in the short-side direction. The surface of the third magnet facing the second magnet has the same pole polarity as the surface on the target holder side of the second magnet, and the surface facing the first magnet has the same pole polarity as surface on the target holder side of the first magnet.

Sputtering device and magnet unit

A sputtering apparatus comprises: a target holder; and a magnet unit of a rectangular shape having long and short sides. The magnet unit includes: a first magnet; a second magnet disposed surrounding the first magnet and magnetized in a different and opposite direction from a direction of magnetization of the first magnet, and a third magnet located at part between the first magnet and the second magnet in the short-side direction and at least at a center position between the first magnet and the second magnet, the third magnet being magnetized in the short-side direction. In the third magnet, a surface facing the second magnet has the same polarity as that of a surface of the second magnet on the target holder side, and a surface facing the first magnet has the same polarity as that of a surface of the first magnet on the target holder side.

Sputtering apparatus and magnet unit

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Precision casting method and precision cast product produced with this precision casting method

Method for manufacturing resin pattern and lost wax precision casting method using this resin pattern

Sputtering device and magnet unit

Sputtering apparatus and magnet unit