H. Tadatomo
Osaka University
5 Papers
16 Citations
H. Tadatomo is an academic researcher from Osaka University. The author has contributed to research in topics: Superconductivity & Etching (microfabrication). The author has an hindex of 3, co-authored 4 publications.
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Papers
Superconducting electronic state in optimally doped YBa 2 Cu 3 O 7-δ observed with laser-excited angle-resolved photoemission spectroscopy
M. Okawa,Kyoko Ishizaka,Hiroshi Uchiyama,H. Tadatomo,Takahiko Masui,Setsuko Tajima,X. Y. Wang,C. T. Chen,Shuntaro Watanabe,A. Chainani,Tomohiko Saitoh,Shik Shin +11 more
TL;DR: In this paper, a low-energy electronic structure of optimally doped cuprates was investigated using laser-excited angle-resolved photoemission spectroscopy, where the surface state and the CuO chain band were not detected, thus enabling a clear observation of the bulk superconducting state.
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Crossover between magnetic vortex attraction and repulsion in thin films of layered superconductors
Alexandre I. Buzdin,Alexei S. Melnikov,A. V. Samokhvalov,Tetsuya Akashi,Takahiko Masui,T. Matsuda,Setsuko Tajima,H. Tadatomo,Akira Tonomura,Akira Tonomura +9 more
TL;DR: In this paper, a theoretical analysis and Lorentz microscopy experimental data for high-temperature superconducting cuprates are presented, which provide evidence of the interplay between long-ranged repulsion caused by an extremely slow decay of the supercurrent induced by a single vortex line (Pearl's effect) and the attraction caused by the tilt of the vortex lines with respect to the anisotropy axes.
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Bulk-sensitive laser-ARPES study on the cuprate superconductor YBa2Cu3O7-δ
M. Okawa,Kyoko Ishizaka,Hiroshi Uchiyama,H. Tadatomo,Takahiko Masui,Setsuko Tajima,X. Y. Wang,C. T. Chen,Shuntaro Watanabe,Ashish Chainani,Tomohiko Saitoh,Shik Shin +11 more
TL;DR: In this article, the authors investigated the bulk superconducting electronic structure in optimally doped YBa 2 Cu 3 O 7 - δ (YBCO) using laser-excited angle-resolved photoemission spectroscopy.
3
Approaches to enable patterning of tight pitches towards high NA EUV
H. Tadatomo,Arnaud Dauendorffer,T. Onitsuka,H. Genjima,Yasuyuki Ido,Soichiro Okada,Yuhei Kuwahara,Arisa Hara,Cong Que Dinh,Seiji Fujimoto,Shinichiro Kawakami,Makoto Muramatsu,Satoru Shimura,Kathleen Nafus,Noriaki Oikawa,Kenta Ono,Yannick Feurprier,Marc Demand,Ainhoa Romo Negreira,Seiji Nagahara,Blanco Victor,Philippe Foubert,Danilo De Simone +22 more
- 25 May 2022
TL;DR: Wang et al. as mentioned in this paper used a developer rinse process and a top deposition treatment during the etch process to overcome the patterning trade-off of LS and CH, and two different approaches were demonstrated.
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