The invention discloses a laser projection apparatus. The laser projection apparatus comprises a substrate, a diffraction optical element and a zero-order diffraction suppression unit, wherein the substrate is used for fixing a light source, and the light source is used for emitting light beams; the diffraction optical element is used for receiving and expanding the light beams, and projecting patterned light beams to a target space; and the zero-order diffraction suppression unit comprises a polarizer and an analyzer and positioned on one side of the light beams emitted by the diffraction optical element and used for shielding or attenuating the zero-order diffraction light beams in the patterned light beams. By virtue of the laser projection apparatus provided by the invention, the zero-order diffraction light beams can be eliminated or weakened.

Laser projection apparatus capable of suppressing zero-order diffraction

A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.

Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method

The invention discloses an alignment device for lithography equipment. The alignment device comprises an alignment light source, a first projection system, a reference grating, a second projection system and a signal processing system; the alignment light source is used for providing an illuminating beam for the surface of an alignment mark; the illuminating beam is projected onto the alignment mark and then reflected by the alignment mark to form diffraction light, and the first projection system is used for converging diffraction light; the diffraction light is converged by the first projection system and then penetrates through the reference grating to form an interference fringe; the second projection system is used for projecting the interference fringe to the detector and blocking the diffraction light without the alignment mark and relative location information of the reference grating to reach the detector; the signal processing system is used for conducting signal processing according to an interference fringe image obtained by the detector to obtain the alignment position.

Alignment device for lithography equipment and alignment method

Methods and apparatus for measuring a target formed on a substrate are disclosed. The target (80) comprises an alignment structure (76A-D) and a metrology structure (84). In one method, a first measurement process is performed that comprises illuminating the target with first radiation and detecting radiation resulting from scattering of the first radiation from the target. A second measurement process comprises illuminating the target with second radiation and detecting radiation resulting from scattering of the second radiation from the target. The first measurement process detects a position of the alignment structure. The second measurement process uses the position of the alignment structure detected by the first measurement process to align a radiation spot (82) of the second radiation onto a desired location within the metrology structure.

Method of measuring a target, metrology apparatus, lithographic cell, and target

The invention relates to an alignment mark imaging and measuring apparatus, and a lithography apparatus The alignment mark imaging and measuring apparatus comprises: a coherent light source for generating irradiation light; a polarization beam splitter for reflecting the irradiation light emitted by the coherent light source to form horizontal linear polarization light; a 1/4 wave plate for converting the incident horizontal linear polarization light into circular polarization light; a first convex lens unit for focusing the circular polarization light on the surface of an alignment mark, wherein the circular polarization light is reflected and diffracted on the surface of the alignment mark to form zero order light and diffraction light, and the zero order light and the diffraction light are transmitted through the first convex lens unit, the 1/4 wave plate and the polarization beam splitter; a second convex lens unit for focusing the zero order light and the diffraction light permeating the second convex lens unit to an imaging unit; a phase shift unit for converting the phase of the zero order light of the second convex lens unit to a phase same to the phase of the diffraction light permeating the second convex lens unit; and a light filtering unit for attenuating the intensity of the zero order light permeating the phase shift unit The alignment precision and the alignment efficiency of the alignment mark imaging and measuring apparatus are high

Alignment mark imaging and measuring apparatus, and lithography apparatus

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Alignment mark imaging and measuring apparatus, and lithography apparatus