A laser condensing optical system of the present invention includes a laser beam source which emits a laser beam, a condensing optical system which is arranged between the laser beam source and a medium and condenses the laser beam in the medium, and a laser divergence point moving unit which can move the position of a laser divergence point of the laser beam along an optical axis of the laser beam in accordance with the refractive index of the medium in which the laser beam is desired to be condensed and the distance from a surface of the medium to a position where the beam is desired to be condensed.

Laser processing device

An objective lens for recording information on and/or reproducing information from an optical information recording medium, comprises a diffractive structure including ring-shaped diffractive zones on at least one surface thereof. The objective lens is a single lens made of plastic material, at least one surface thereof is an aspheric surface, and the following conditional formula is satisfied; NA ≧ 0.7 where NA represents an image side numerical aperture necessary for recording on and/or reproducing from an optical information recording medium.

Objective lens, light converging optical system, optical pickup apparatus, and recording/reproducing apparatus

Apparatus for the industrial processing of a material (6) by optical radiation (10), which apparatus comprises a waveguide (1) for delivering the optical radiation (10), and focussing optics (5) for directing the optical radiation (10) from an output end (12) of the waveguide (1) onto the material (6), wherein the waveguide (1) has a guidance profile (19) across its cross section defined by its refractive index profile (25) and optical gain profile (17), and wherein the guidance profile (19) and focussing optics (5) are such that optical power distribution (16) at the surface (14) of the material (6) has first and second optical powers, (P1), (P2) which are located at first and second radii (r1). (r2) from the centre of the optical power distribution (16) and which are of substantially higher intensity than a third optical power (P3) at a third radius (r3) that is smaller than the first and the second radii (rl), (r2).

Apparatus for the industrial processing of a material by optical radiation

A battery comprises at least one battery cell on a support, the battery cell comprising a plurality of electrodes about an electrolyte, and having a surface. A thermoplastic material covers the surface of the battery cell, the thermoplastic material comprising a nitrogen permeability or oxygen permeability that is less than 20 cm 3 *mm/(m 2 *day). A cap covers the thermoplastic material.

Battery with protective packaging

A substrate cutting apparatus includes a stage configured to support a substrate, a first laser generator configured to emit a first laser beam toward the substrate, the first laser beam being a short-pulse laser beam, and a beam swing unit disposed on a beam path of the first laser beam, the beam swing unit being configured to swing the first laser beam in a predetermined light irradiating section on the substrate, the light irradiating section on the substrate including at least one of a curved line section and a straight line section.

Substrate cutting apparatus and method of cutting substrate using the same

A laser system wherein, in order that a high-output and high-quality single mode of a cross sectional area larger than the beam diameter determined by the construction of a resonator can be obtained stably, although this has heretofore been impossible, there is used a coupling mirror provided with a partial reflection film and an antireflecting film, a laser beam mode is selected using the partial reflection film, a phase difference between laser beam portions caused by a difference in construction between the partial reflection film and the antireflecting film is compensated using a phase difference compensating apparatus, and there is formed an aperture whose diameter is set to a value of not larger than four times the diameter of the partial reflection film.

Laser system with transverse mode selecting output coupler

A laser processing apparatus which makes it possible to select a laser beam mode always optimally suited to processing of a workpiece on the basis of a change in the focusing characteristic of each mode and the amount of movement of the beam's focal point with respect to a change in a laser output value. The laser processing apparatus includes a laser oscillator capable of changing the beam mode of its laser beam, and a processing table, all controlled by a controller which operates to change the beam mode of the oscillator in correspondence with a laser output during processing.

Laser processing apparatus with beam mode control

A laser oscillator has a casing 10. A cooling medium is supplied from an inlet port 134 to a heat exchanger 8 via a pipe 35, and discharged form it via a pipe 37 and an outlet port 136. The ports 134 and 136 are symmetrically positioned relative to a center line of the casing when seen from upward. An inlet port 340 and an outlet port 342 have a similar positional relation ship thereto.

Laser oscillator with stabilized pointing

A laser oscillator comprising a laser resonator having a plurality of mirrors for directing the laser energy from source to exit apertures, the mirrors being constructed and mounted adjustably for reducing parasitic oscillations. The mirrors are mounted in adjusting members that have channels therein for coolant and are provided with heat insulating members that minimize heat gradients and unwanted heat transfers that may result in the distortion of the reflecting surfaces. In addition, the mirrors are angled so that light paths are defined that present a Z-shaped turning pattern. Apertures proximate to the mirrors through which the light beams are directed are offset from a common plane so that a reflective surface is not within the aperture of the opposing reflective surface. One or more of the apertures can be so offset to reduce the possibility of parasitic oscillations. Further, the reflectors can be angled and the apertures sized so as to eliminate parasitic oscillations.

Laser oscillating apparatus with mirror angle adjustment

The laser oscillator has a laser resonator with a number of mirrors (28) between the laser source and the exit window, which are adjustable for reducing the parasitic oscillations. The mirrors are supported by setting plates (40) for adjusting the mirror angle, provided with flow channels for a cooling medium (56) and having an associated optical plate (38) which is thermally insulated from the cooling medium (56). Pref. the thermal insulation components (60a, 60b) are fitted to the optical plate (38) via O-rings (62) and incorporate bores (51a, 51b) for the cooling medium (56), while preventing direct heat transfer between the optical plate (38) and the cooling medium (56). ADVANTAGE - Provides laser beam with stabilised target direction.

Laser oscillator providing stabilised beam - + with setting plates for resonator mirrors and associated optical plate supported by thermal insulation components

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