TL;DR: Substrates of fused quartz and ULE with the roughness, satisfying the requirements of diffraction-quality optics intended for working in the spectral range below 10 nm, are made.
Abstract: The main problems and the approach used by the authors for roughness metrology of super-smooth surfaces designed for diffraction-quality X-ray mirrors are discussed. The limitations of white light interferometry and the adequacy of the method of atomic force microscopy for surface roughness measurements in a wide range of spatial frequencies are shown and the results of the studies of the effect of etching by argon and xenon ions on the surface roughness of fused quartz and optical ceramics, Zerodur, ULE and Sitall, are given. Substrates of fused quartz and ULE with the roughness, satisfying the requirements of diffraction-quality optics intended for working in the spectral range below 10 nm, are made.
TL;DR: The use of wollastonite in the ceramics industry has good prospects as mentioned in this paper, due to its high dielectric parameters, due to which it is used in electrical and radio engineering.
Abstract: Natural and artificial wollastonite is used in the production of ceramics, devitrified glass (sitall), and as a polymer filler. Wollastonite additives decrease the firing temperature of ceramics, improve their strength, decrease the firing and drying shrinkages and the temperature of formation of the vitreous phase. Due to the high dielectric parameters, wollastonite ceramics are used in electrical and radio engineering. The use of wollastonite in the ceramics industry has good prospects.
TL;DR: In this article, the authors reviewed the development of modern methods of precision surface polishing for the production of electronic device and optical system elements from glass and optical and semiconductor crystals.
Abstract: Studies on the development of modern methods of precision surface polishing for the production of electronic device and optical system elements from glass and optical and semiconductor crystals are reviewed. The mechanisms that underlie material removal from the workpiece surface are described for polishing with a tool with bound abrasive, mechanical polishing with polishing powder suspensions, and chemicomechanical polishing. The results of the study of the mechanism that underlies the formation of the optical surface nanoprofile during polishing are presented and the relevance of studying the regularities of ultrasmooth surface formation during chemicomechanical polishing is emphasized.
TL;DR: In this paper, the authors describe the laser-induced chemical liquid phase deposition of copper using a solution containing a non-ionic surfactant on substrates comprising either an oxide glass or a glass-ceramic Sitall.
TL;DR: In this paper, the laser-induced modifications in two kinds of glass-ceramics (GCs) with composition TiO2•SiO2 (Sitall ST-50) and Li2O• SiO2(Fotoform) were investigated for fabricating optical elements.