Topic
Quantum lithography
About: Quantum lithography is a research topic. Over the lifetime, 113 publications have been published within this topic receiving 4469 citations.
Papers published on a yearly basis
Papers
12 May 2000
TL;DR: It is shown how to write arbitrary 2D patterns by using the nonclassical photon-number states method, and a factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion.
Abstract: Summary form only given. It has been known for some time that entangled photon pairs, such as generated by spontaneous parametric down conversion, have unusual imaging characteristics with sub-shot-noise interferometric phase measurement. In fact, Fonseca, et al., recently demonstrated resolution of a two-slit diffraction patterned at half the Rayleigh limit in a coincidence counting experiment. What we show is that this type of effect is possible not only in coincidence counting experiments, but also in real two-photon absorbing systems, such as those used in classical interferometric lithography. In particular, we will demonstrate that quantum entanglement is the resource that allows sub-diffraction limited lithography.
1,646 citations
TL;DR: In this paper, it was shown that a thermal light source which is random in the transverse direction can produce a sub-wavelength double slit interference in a joint intensity measurement, which can be explained with the correlation of rays instead of the entanglement of photons.
Abstract: We show that a thermal light source which is random in the transverse direction can produce a sub-wavelength double slit interference in a joint intensity measurement. This is the classical version of quantum lithography, and it can be explained with the correlation of rays instead of the entanglement of photons.
120 citations
TL;DR: In these experiments, an N-photon-absorption recording medium is simulated by Nth harmonic generation followed by a CCD camera, suggesting that the improved resolution achieved through use of "quantum lithography" results primarily from the nonlinear response of the recording medium and not from quantum features of the light field.
Abstract: A nonlinear optical, interferometric method for improving the resolution of a lithographic system by an arbitrarily large factor with high visibility is described. The technique is implemented experimentally for both two-fold and three-fold enhancement of the resolution with respect to the traditional Rayleigh limit. In these experiments, an N-photon-absorption recording medium is simulated by Nth harmonic generation followed by a CCD camera. This technique does not exploit quantum features of light; this fact suggests that the improved resolution achieved through use of “quantum lithography” results primarily from the nonlinear response of the recording medium and not from quantum features of the light field.
114 citations
TL;DR: In this paper, a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber or coincidence detection was proposed.
Abstract: I propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber or coincidence detection. Using the same nonclassical states of light as those for quantum lithography, the proposed method requires only optical intensity measurements, followed by image postprocessing, to produce the same complex quantum interference patterns as those in quantum lithography. The method is expected to be experimentally realizable using current technology.
110 citations
TL;DR: In this article, the authors focus on the new ways that have been developed to exploit quantum optical entanglement in quantum metrology to beat the shot-noise limit, which can be used, e.g., in fiber optical gyroscopes and in sensors for biological or chemical targets.
Abstract: Over the past 20 years, bright sources of entangled photons have led to a renaissance in quantum optical interferometry. Optical interferometry has been used to test the foundations of quantum mechanics and implement some of the novel ideas associated with quantum entanglement such as quantum teleportation, quantum cryptography, quantum lithography, quantum computing logic gates, and quantum metrology. In this paper, we focus on the new ways that have been developed to exploit quantum optical entanglement in quantum metrology to beat the shot-noise limit, which can be used, e.g., in fiber optical gyroscopes and in sensors for biological or chemical targets. We also discuss how this entanglement can be used to beat the Rayleigh diffraction limit in imaging systems such as in LIDAR and optical lithography.
93 citations
Related Topics (5)
Performance Metrics
| Year | Papers |
|---|---|
| 2018 | 3 |
| 2017 | 1 |
| 2016 | 3 |
| 2015 | 4 |
| 2014 | 6 |
| 2013 | 4 |