Morphology Analysis Method

Abstract: The invention relates to the technical field of semiconductor manufacturing, in particular to a morphology analysis method and device for an etching structure. The morphology analysis method of the etching structure comprises the following steps: providing a substrate, wherein the substrate is internally provided with the etching structure; filling the etching structure to form a filling structure; removing the substrate, and exposing the filling structure; and analyzing the filling structure to obtain the morphology of the etching structure. According to the method, the morphology analysis step of the etching structure is simplified, and the morphology analysis accuracy of the etching structure is improved.

Abstract: Basic studies on ultrafast laser ablation processes are important for expanding their utility. In particular, understanding the ablated morphology in relation to the incident pulse is critical for micromachining, and an important benchmark for simulations. However, current morphological analyses rely on vast simplifications of experimental conditions, such as a singular fluence value to reduce a unique beam profile, or the maximum crater depth or diameter to describe the ablated morphology. Here, we develop a morphology analysis method in which we take the full two-dimensional information of both the input beam profile and the ablated morphology, and spatially correlate the two without data reduction. We show, using sapphire as a benchmark material, that this serves as a robust way to extract well-studied values and dependencies, such as the ablation threshold, and also as a way to probe the spatial independence of the process. We anticipate that our findings will modernize current study techniques to meet the demand for increased, high-quality data such as that required for artificial intelligence-based analysis. Describing the laser ablation process with reduction-free data is important for furthering its use in modern manufacturing. Here, fluence maps, correlating laser beam intensity and ablated depth at each point in a full two-dimensional space, provide a method to probe ablation morphology in cases of arbitrary beam and crater profiles.