Topic
Hexafluoroethane
About: Hexafluoroethane is a research topic. Over the lifetime, 204 publications have been published within this topic receiving 2886 citations. The topic is also known as: 1,1,1,2,2,2-hexafluoroethane & perfluoroethane.
Papers published on a yearly basis
1 / 2
Papers
TL;DR: In this paper, the coefficients of these short forms for the equations of state have been fitted for the fluids acetone, carbon monoxide, carbonyl sulfide, decane, hydrogen sulfide and fluoromethane.
Abstract: In a preceding project, functional forms for “short” Helmholtz energy equations of state for typical nonpolar and weakly polar fluids and for typical polar fluids were developed using simultaneous optimization. In this work, the coefficients of these short forms for the equations of state have been fitted for the fluids acetone, carbon monoxide, carbonyl sulfide, decane, hydrogen sulfide, 2-methylbutane (isopentane), 2,2-dimethylpropane (neopentane), 2-methylpentane (isohexane), krypton, nitrous oxide, nonane, sulfur dioxide, toluene, xenon, hexafluoroethane (R-116), 1,1-dichloro-1-fluoroethane (R-141b), 1-chloro-1,1-difluoroethane (R-142b), octafluoropropane (R-218), 1,1,1,3,3-pentafluoropropane (R-245fa), and fluoromethane (R-41). The 12 coefficients of the equations of state were fitted to substance specific data sets. The results show that simultaneously optimized functional forms can be applied to other fluids out of the same class of fluids for which they were optimized without significant loss of a...
734 citations
Patent•
19 Nov 1982TL;DR: In this paper, it was shown that increased fluorine dopant can be provided with less fluorine-dopant-forming compound, when the fluorine compound is hexafluoroethane (C 2 F 6 ).
Abstract: Doped silica glass can be manufactured by reacting gaseous vapors of silica-forming compounds and dopant-forming compounds. Increased fluorine dopant can be provided with less fluorine dopant-forming compound, when the fluorine dopant-forming compound is hexafluoroethane (C 2 F 6 ).
180 citations
TL;DR: In this article, the authors present atmospheric baseline growth rates from the 1970s to the present for the long-lived, strongly infrared absorbing perfluorocarbons (PFCs) tetrafluoromethane (CF4), hexafluoroethane (C2F6), and octafluoropropane(C3F8) in both hemispheres, measured with improved accuracies and precisions.
Abstract: . We present atmospheric baseline growth rates from the 1970s to the present for the long-lived, strongly infrared-absorbing perfluorocarbons (PFCs) tetrafluoromethane (CF4), hexafluoroethane (C2F6), and octafluoropropane (C3F8) in both hemispheres, measured with improved accuracies (~1–2%) and precisions (
170 citations
TL;DR: In this article, the authors evaluated and synthesized existing knowledge on electron interactions with C2F6 and discussed the following cross sections and their intercomparison: total electron scattering, momentum transfer, integral elastic, differential elastic and differential vibrational, vibrational inelastic.
Abstract: Perfluoroethane (C2F6, hexafluoroethane) is a man-made gas with many important applications (eg, in the aluminum industry, the semiconductor industry, plasma chemistry and etching technologies, and pulsed power switching) In these and other uses, knowledge of the interactions of slow electrons (kinetic energies less than about 100 eV) is fundamental in optimizing performance parameters involved in the particular application We, therefore, have critically evaluated and synthesized existing knowledge on electron interactions with C2F6 The following cross sections and their intercomparison are presented and discussed: total electron scattering, momentum transfer, integral elastic, differential elastic, differential vibrational, vibrational inelastic, total ionization, partial ionization, total dissociation, and electron attachment Information is presented also on the coefficients for electron impact ionization, effective ionization, electron attachment, and electron transport (lateral diffusion coeffic
94 citations
TL;DR: In this article, the authors used surface wave plasmas as an innovative technology for the destruction and removal of perfluorocompounds (PFC) emanating from semiconductor fabrication tools.
Abstract: Application of surface wave plasmas as an innovative technology for the destruction and removal of perfluorocompounds (PFC) emanating from semiconductor fabrication tools is demonstrated. The destruction of parts per thousand (ppt) concentrations of hexafluoroethane, C2F6, in oxygen and natural gas mixtures has been investigated as a function of microwave power in a low-pressure plasma reactor at 11.3 Torr. Effluent analysis included the determination of destruction and removal efficiencies (DRE) and product distributions by Fourier transform infrared spectroscopy and mass spectrometry. Destruction and removal efficiences of up to 99.6% for C2F6 were achieved using applied microwave powers from 500 to 2000 W, which corresponded to millisecond range residence times within the plasma. Product analysis indicated that hexafluoroethane conversion was limited to low molecular weight gases such as CO2, CO, COF2, H2O, and HF. CF4 was not produced as a plasma byproduct in any significant quantities. These investig...
87 citations
Related Topics (5)
Performance Metrics
| Year | Papers |
|---|---|
| 2021 | 3 |
| 2020 | 2 |
| 2019 | 7 |
| 2018 | 10 |
| 2017 | 4 |
| 2016 | 8 |