TL;DR: In this paper, a baffle is interposed between a wound drain connection and vacuum connection in a drain reservoir and protects a hydrophobic filter which is at the end of a vacuum passage communicating with the interior of the drain reservoir.
Abstract: Apparatus for selectively blocking passage of lipids in a liquid flow path. A baffle interposed in the liquid flow path is of nonpolar material and is arranged to permit liquid flow therethrough with contact of said liquid with the nonpolar material of the baffle for removing lipids from the flow. In one embodiment, the baffle is interposed between a wound drain connection and vacuum connection in a drain reservoir and protects a hydrophobic filter which is at the end of a vacuum passage communicating with the interior of the drain reservoir. The baffle enables use of a nonpolar material for the hydrophobic filter and avoids coating and thereby clogging of the hydrophobic filter by lipids in the liquid drained from a wound.
TL;DR: In this article, a baffle is interposed between wound drain connection and vacuum connection in a drain reservoir and protects the hydrophobic filter which is at the end of the vacuum passage communicating with the interior of the drain reservoir bottle.
Abstract: Apparatus for selectively blocking passage of lipids in a liquid flow path A baffle interposed in the liquid flow path is of nonpolar material and is arranged to permit liquid flow therethrough with contact of said liquid with the nonpolar material of the baffle for removing lipids from the flow In one embodiment, the baffle is interposed between the wound drain connection and vacuum connection in a drain reservoir and protects the hydrophobic filter which is at the end of the vacuum passage communicating with the interior of the drain reservoir bottle The baffle enables use of a nonpolar material for the hydrophobic filter and avoids coating and thereby clogging of the hydrophobic filter by lipids in the liquid drained from a wound
TL;DR: In this paper, a gas distribution system for uniformly or non-uniformly distributing gas across the surface of a semiconductor substrate is described, which includes a support plate and a showerhead.
Abstract: A gas distribution system for uniformly or non-uniformly distributing gas across the surface of a semiconductor substrate. The gas distribution system includes a support plate and a showerhead which are secured together to define a gas distribution chamber therebetween. A baffle assembly including one or more baffle plates is located within the gas distribution chamber. The baffle arrangement includes a first gas supply supplying process gas to a central portion of the baffle chamber and a second gas supply supplying a second process gas to a peripheral region of the baffle chamber. Because the pressure of the gas is greater at locations closer to the outlets of the first and second gas supplies, the gas pressure at the backside of the showerhead can be made more uniform than in the case with a single gas supply. In one arrangement, the first and second gas supplies open into a plenum between a top baffle plate and a temperature controlled support member wherein the plenum is divided into the central and peripheral regions by an O-ring. In a second arrangement, the first gas supply opens into the central region above an upper baffle plate and the second gas supply opens into the periphery of a plenum between the upper baffle plate and a lower baffle plate.
TL;DR: In this article, a set of CFD simulations for a single shell and single tube pass heat exchanger with a variable number of baffles and turbulent flow were performed, and the best turbulence model among the ones considered was determined by comparing the CFD results of heat transfer coefficient, outlet temperature and pressure drop with the Bell-Delaware method results.
TL;DR: In this article, the authors explored the use of a non-traditional optimization technique; called particle swarm optimization (PSO), for design optimization of shell-and-tube heat exchangers from economic view point.