Avalanche breakdown

Abstract: Elemental and compound semiconductors, including wide-bandgap semiconductors, are critically examined for high-power electronic applications in terms of several parameters. On the basis of an analysis applicable to a wide range of semiconducting materials and by using the available measured physical parameters, it is shown that wide-bandgap semiconductors such as SiC and diamond could offer significant advantages compared to either silicon or group III-V compound semiconductors for these applications. The analysis uses peak electric field strength at avalanche breakdown as a critical material parameter for evaluating the quality of a semiconducting material for high-power electronics. Theoretical calculations show improvement by orders of magnitude in the on-resistance, twentyfold improvement in the maximum frequency of operation, and potential for successful operation at temperatures beyond 600 degrees C for diamond high-power devices. New figures of merit for power-handling capability that emphasize electrical and thermal conductivities of the material are derived and are applied to various semiconducting materials. It is shown that an improvement in power-handling capabilities of semiconductor devices by three orders of magnitude is feasible by replacing silicon with silicon carbide; improvement in power-handling capability by six orders of magnitude is projected for diamond-based devices. >

Abstract: A key element in the integration of microprocessor chips with optical communications circuits is a photodetector to mediate the optical and electronic signals. Germanium photodetectors are very attractive in this regard because they are compatible with conventional silicon circuitry, but they suffer from noise that limits their performance. Assefa et al. now show how the poor intrinsic noise characteristics of germanium can be overcome through the careful engineering of optical and electrical fields at the nanometre scale. The result is a compact and efficient photodetector that could enable a range of optoelectronic applications. To integrate microchips with optical communications a photodetector is required to mediate the optical and electronic signals. Although germanium photodetectors are compatible with silicon their performance is impaired by poor intrinsic noise. Here the noise is reduced by nanometre engineering of optical and electrical fields to produce a compact and efficient photodetector. Integration of optical communication circuits directly into high-performance microprocessor chips can enable extremely powerful computer systems1. A germanium photodetector that can be monolithically integrated with silicon transistor technology2,3,4,5,6,7,8 is viewed as a key element in connecting chip components with infrared optical signals. Such a device should have the capability to detect very-low-power optical signals at very high speed. Although germanium avalanche photodetectors9,10 (APD) using charge amplification close to avalanche breakdown can achieve high gain and thus detect low-power optical signals, they are universally considered to suffer from an intolerably high amplification noise characteristic of germanium11. High gain with low excess noise has been demonstrated using a germanium layer only for detection of light signals, with amplification taking place in a separate silicon layer12. However, the relatively thick semiconductor layers that are required in such structures limit APD speeds to about 10 GHz, and require excessively high bias voltages of around 25 V (ref. 12). Here we show how nanophotonic and nanoelectronic engineering aimed at shaping optical and electrical fields on the nanometre scale within a germanium amplification layer can overcome the otherwise intrinsically poor noise characteristics, achieving a dramatic reduction of amplification noise by over 70 per cent. By generating strongly non-uniform electric fields, the region of impact ionization in germanium is reduced to just 30 nm, allowing the device to benefit from the noise reduction effects13,14,15 that arise at these small distances. Furthermore, the smallness of the APDs means that a bias voltage of only 1.5 V is required to achieve an avalanche gain of over 10 dB with operational speeds exceeding 30 GHz. Monolithic integration of such a device into computer chips might enable applications beyond computer optical interconnects1—in telecommunications16, secure quantum key distribution17, and subthreshold ultralow-power transistors18.

Abstract: The concentration of the electric field strength in the neighborhood of micropores and cracks may lower the nominal external intensity for electric avalanche breakdown by a factor 2-100 depending on the geometry of the crack and the dielectric constant. The presence of absorbing inclusions at the edge of microcracks will often be the dominant mechanism giving the lowest surface damage threshold. Inclusions and cracks with characteristic dimensions less than about 10(-6) cm will not lower the breakdown threshold appreciably.