Topic
Advanced process control
About: Advanced process control is a research topic. Over the lifetime, 1547 publications have been published within this topic receiving 19211 citations.
Papers published on a yearly basis
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Papers
Book•
26 Dec 2002
TL;DR: This is the first complete introduction to process control that fully integrates software tools-enabling professionals and students to master critical techniques hands on, through computer simulations based on the popular MATLAB environment.
Abstract: Master process control hands on, through practical examples and MATLAB(R) simulationsThis is the first complete introduction to process control that fully integrates software tools-enabling professionals and students to master critical techniques hands on, through computer simulations based on the popular MATLAB environment. Process Control: Modeling, Design, and Simulation teaches the field's most important techniques, behaviors, and control problems through practical examples, supplemented by extensive exercises-with detailed derivations, relevant software files, and additional techniques available on a companion Web site. Coverage includes: Fundamentals of process control and instrumentation, including objectives, variables, and block diagrams Methodologies for developing dynamic models of chemical processes Dynamic behavior of linear systems: state space models, transfer function-based models, and more Feedback control; proportional, integral, and derivative (PID) controllers; and closed-loop stability analysis Frequency response analysis techniques for evaluating the robustness of control systems Improving control loop performance: internal model control (IMC), automatic tuning, gain scheduling, and enhancements to improve disturbance rejection Split-range, selective, and override strategies for switching among inputs or outputs Control loop interactions and multivariable controllers An introduction to model predictive control (MPC)Bequette walks step by step through the development of control instrumentation diagrams for an entire chemical process, reviewing common control strategies for individual unit operations, then discussing strategies for integrated systems. The book also includes 16 learning modules demonstrating how to use MATLAB and SIMULINK to solve several key control problems, ranging from robustness analyses to biochemical reactors, biomedical problems to multivariable control.
869 citations
TL;DR: In this paper, the authors discuss the evolution of machining process monitoring and control technologies and conduct an in-depth review of the state-of-the-art of these technologies over the past decade.
Abstract: Research in automating the process level of machining operations has been conducted, in both academia and industry, over the past few decades. This work is motivated by a strong belief that research in this area will provide increased productivity, improved part quality, reduced costs, and relaxed machine design constraints. The basis for this belief is twofold. First, machining process automation can be applied to both large batch production environments and small batch jobs. Second, process automation can autonomously tune machine parameters (feed, speed, depth of cut, etc.) on-line and off-line to substantially increase the machine tool's performance in terms of part tolerances and surface finish, operation cycle time, etc. Process automation holds the promise of bridging the gap between product design and process planning, while reaching beyond the capability of a human operator. The success of manufacturing process automation hinges primarily on the effectiveness of the process monitoring and control systems. This paper discusses the evolution of machining process monitoring and control technologies and conducts an in-depth review of the state-of-the-art of these technologies over the past decade. The research in each area is highlighted with experimental and simulation examples. Open architecture software platforms that provide the means to implement process monitoring and control systems are also reviewed. The impact, industrial realization, and future trends of machining process monitoring and control technologies are also discussed.
361 citations
1 Jan 2002
TL;DR: A review of the state of the art of machining process monitoring and control technologies can be found in this article, where the authors discuss the benefits of the systems and the reasons for their delayed realization in many industrial application domains.
Abstract: Automation at the process level for machining operations and machine tools has been a focus of research attention in both academia and industry alike for several decades. Research in this area has carried strong expectations in the context of increased productivity, improved part quality, reduced costs, and relaxed part design constraints. The basis for these expectations is two-fold. First, machining process automation, if exercised strategically and advantageously, can perform consistently for large batch production or flexibly for small batch jobs. Secondly, process automation can be set up to autonomously tune the machine parameters (feed, speed, depth of cut, etc.) in pursuit of desirable performance (tolerance, finish, cycle time, etc.), thereby bridging the gap between product design and process planning while reaching beyond the human operators’ capability. The success of manufacturing process automation hinges primarily on the effectiveness of process monitoring and control systems. This paper reviews the evolution and the state of the art of machining process monitoring and control technologies. Key issues to be presented include sensor techniques, control techniques, hardware availability, and implementation examples. Also to be reviewed are the benefits of the systems and the reasons for their delayed realization in many of today’s industrial application domains.Copyright © 2002 by ASME
341 citations
Patent•
18 Nov 1996
TL;DR: In this article, a plasma monitoring and control method and system monitor and control plasma in an electronic device fabrication reactor by sensing the voltage of the radio frequency power that is directed into the plasma producing gas at the input to the plasma-forming environment of the EDF.
Abstract: A plasma monitoring and control method and system monitor and control plasma in an electronic device fabrication reactor by sensing the voltage of the radio frequency power that is directed into the plasma producing gas at the input to the plasma producing environment of the electronic device fabrication reactor. The method and system further senses the current and phase angle of the radio frequency power directed to the plasma producing gas at the input to the plasma producing environment. Full load impedance is measured and used in determining characteristics of the plasma environment, including not only discharge and sheath impedances, but also chuck and wafer impedances, primary ground path impedance, and a secondary ground path impedance associated with the plasma environment. This permits end point detection of both deposition and etch processes, as well as advanced process control for electronic device fabrication. The invention also provides automatic gain control features for applying necessary signal gain control functions during the end point and advanced process control operations.
289 citations
Book•
31 Dec 1969
TL;DR: The sixth edition of Process Control Instrumentation Technology as mentioned in this paper provides a comprehensive working knowledge of process control and control systems, from the fundamental theoretical concepts to the more practical aspects of assembling, troubleshooting, adjusting and operating a control system.
Abstract: From the Publisher:
The sixth edition of Process Control Instrumentation Technology provides a comprehensive working knowledge of process control and control systems, from the fundamental theoretical concepts to the more practical aspects of assembling, troubleshooting, adjusting and operating a control system. Using this text to obtain a solid foundation, readers can design the elements of a control system from the practical perspective as well as understand how these elements affect overall system operation and tuning. All of this is accomplished without the necessity of advanced math and theory or on-the-job experience.
277 citations
Related Topics (5)
Performance Metrics
| Year | Papers |
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| 2025 | 1 |
| 2023 | 9 |
| 2022 | 6 |
| 2021 | 30 |
| 2020 | 51 |
| 2019 | 29 |