Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region
Kanta Kusaka,Hiroyuki Kurosawa,Seigo Ohno,Yozaburo Sakaki,Kazuyuki Nakayama,Yuto Moritake,Teruya Ishihara +6 more
TL;DR: 1D, 2D and 3D subwavelength resist patterns that are widely used for the fabrication of metamteterials in the visible region are demonstrated and a resonance at 1.9 eV for a split tube structure experimentally is demonstrated.
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Abstract: We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask patterns for the first time TM1 mode in the waveguide is shown to be useful for providing a three-dimensional structure whose cross section is checkerboard pattern Applying our WMIL technique, we demonstrate 1D, 2D and 3D subwavelength resist patterns that are widely used for the fabrication of metamteterials in the visible region In addition to the resist patterns, we demonstrate a resonance at 19 eV for a split tube structure experimentally
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Citations
High Chromaticity Aluminum Plasmonic Pixels for Active Liquid Crystal Displays
Jana Olson,Alejandro Manjavacas,Tiyash Basu,Da Huang,Andrea E. Schlather,Bob Zheng,Naomi J. Halas,Peter Nordlander,Stephan Link +8 more
TL;DR: It is shown that by utilizing another collective coupling effect, Fano interference, it is possible to substantially narrow the short-wavelength side of the pixel spectral response, resulting in aluminum pixels with far more vivid, monochromatic coloration across the entire RGB color gamut than previously attainable.
•Journal Article
Low-loss multilayered metamaterial exhibiting a negative index of refraction at visible wavelengths
TL;DR: In this article, a low-loss multilayered metamaterial exhibiting a double negative refractive index in the visible spectral range is presented, exploiting a second-order magnetic resonance of the so-called fishnet structure.
Large-Area High Aspect Ratio Plasmonic Interference Lithography Utilizing a Single High-k Mode
TL;DR: In this work, periodic patterns with high aspect ratios and a half-pitch of about 1/6 of the wavelength were achieved with pattern uniformity in square centimeter areas.
63
Classical and fluctuation‐induced electromagnetic interactions in micron‐scale systems: designer bonding, antibonding, and Casimir forces
Alejandro W. Rodriguez,Pui-Chuen Hui,David P. Woolf,Steven G. Johnson,Marko Loncar,Federico Capasso +5 more
TL;DR: In this paper, the authors survey recent progress in the understanding and experimental observation of optomechanical and quantum-fluctuation forces, and discuss the potential impact and interplay of these forces in emerging experimental regimes of micromechanical devices.
59
Theoretical study of multiexposure zeroth-order waveguide mode interference lithography
TL;DR: In this article, a new nanolithography technique in which sample rotation is incorporated into zeroth-order waveguide mode interference lithography is proposed, where a 325-nm laser was used to excite the waveguide modes, which were loaded by an asymmetric metal-cladding dielectric waveguide structure.
49
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Bahaa E. A. Saleh,Malvin C. Teich,Richard E. Slusher +2 more
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Vladimir M. Shalaev,Wenshan Cai,Uday K. Chettiar,Hsiao Kuan Yuan,Andrey K. Sarychev,Vladimir P. Drachev,Alexander V. Kildishev +6 more
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