Patent
Substrate processing apparatus
Yasumi Sago,Masayoshi Ikeda,Kazuaki Kaneko,Okada Takuji +3 more
- 06 Aug 2009
265
TL;DR: In this article, a heat exchanger is constructed by arranging partition walls between two plates to form a fluid channel and a fin parallel with the channel or inclined by a prescribed angle on each of the two plates insides the channel so that the plate or a member in contact with the plate is cooled or heated with the fluid flowing through the channel.
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Abstract: A method of using a heat exchanger efficiently and uniformly to cool or heats portions to be controlled to a prescribed temperature, and then continuously carry out stable processing. The heat exchanger is constructed by arranging partition walls between two plates to form a fluid channel and a fin parallel with the channel or inclined by a prescribed angle on each of the two plates insides the channel so that the plate or a member in contact with the plate is cooled or heated with the fluid flowing through the channel.
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Citations
Patent
Substrate Processing Apparatus
Tamami Takahashi,Mitsuhiko Shirakashi,Kenya Ito,Kazuyuki Inoue,Kenji Yamaguchi,Masaya Seki +5 more
- 16 Feb 2005
TL;DR: In this article, a bypass pipe is connected between the mechanical booster pump and the rest vacuum pumps located at a downstream side of the booster pump to prevent the exhaust gas from diffusing back to the inside of a process chamber.
644
Patent
Method for Manufacturing Semiconductor Device
Hidekazu Miyairi,Koichiro Tanaka,Hironobu Shoji,Shunpei Yamazaki +3 more
- 29 Jun 2007
TL;DR: In this article, the authors proposed a method for manufacturing a semiconductor device, in which the number of photolithography steps can be reduced, the manufacturing process can be simplified, and manufacturing can be performed with high yield at low cost.
323
Patent
Method of manufacturing semiconductor device and substrate processing apparatus
Yushin Takasawa,Hajime Karasawa,Yoshiro Hirose +2 more
- 06 Apr 2015
TL;DR: In this article, a film is formed on a substrate by performing a cycle at least twice, the cycle including a nucleus formation process for forming nuclei on the substrate and a nucleus growth suppression process for suppressing growth of the nuclei.
308
Patent
Substrate processing apparatus and method for manufacturing semiconductor device
Atsushi Sano,Hideharu Itatani,Mitsuro Tanabe +2 more
- 19 Mar 2008
TL;DR: In this paper, a substrate processing apparatus and a method for manufacturing a semiconductor device whereby foreign matter can be prevented from being adsorbed on the substrate, by suppressing agitation of foreign matter present in the processing chamber.
279
Patent
Chemical vapor deposition apparatus
Jong Sun Maeng,Young-sun Kim,Hyun Wook Shim,Sung-tae Kim +3 more
- 21 Jul 2008
TL;DR: In this article, a chemical vapor deposition (CVD) system with a substrate-supporting member for supporting a substrate is described, which is capable of improving the yield by an extension of a cleaning cycle.
263
References
Patent
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- 23 May 2001
TL;DR: In this article, a treatment apparatus for treating a substrate under decompressed atmosphere is described, consisting of a chamber, an exhausting means for exhausting the chamber, a first electrode provided in the chamber on which the substrate is mounted or held, a second electrode provided on the chamber opposing the first electrode, a liquid supply source containing a liquid material from which a process gas is generated, a housing provided between the liquid source and the chamber to be communicated to the liquid supplier and the room, a porous heating unit arranged in the housing for generating the process gas by heating the liquid material supplied
384
Patent
Sputtering device and target with cover to hold cooling fluid
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TL;DR: In this paper, a target, target backing plate, and cover plate form a target plate assembly, which includes an integral cooling passage, and a series of grooves are constructed in either the target back plate or the target cooling cover plate, which are then securely bonded to one another.
118
Patent
Process chamber having improved temperature control
Shamouil Shamouilian,Ananda H. Kumar,Kadthala R. Narendrnath,Eric Farahmand E Askarinam,Edwin C. Weldon,Rice Michael R,Kenneth S. Collins +6 more
- 20 May 1998
TL;DR: In this paper, a temperature control system is used to control the temperature of a process chamber 25 during processing of a semiconductor substrate 70 during the fabrication process of semiconductors.
79
Patent
Dry etching method
Keiji Shinohara
- 24 Dec 1991
TL;DR: In this article, the authors proposed a method for detecting the end point of dry etching by detecting a decrease in emission peak intensities in the molecular spectrum of CuCl appearing the specific wavelengths, such as 402 nm or 433 nm.
63
Patent
Method for providing a thermal transfer device for the removal of heat from packaged elements
William R. Hamburgen
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TL;DR: In this paper, a thermal transfer assembly includes a first assembly having a group of generally parallel cooling fins coupled to the package, such as cooling plate, is a second assembly also including a plurality of generally paralell cooling fins.
31