Patent
Resist coating device
Akihiko Shiguma,Yoshiyuki Maeda +1 more
- 24 Aug 1987
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TL;DR: In this article, the authors proposed a method to form a uniform resist thin film on the surface of a wafer by a method wherein temperature of the atmosphere in the dust cover of a resist coating device is restrained from rising.
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Abstract: PURPOSE:To form a uniform resist thin film on the surface of a wafer by a method wherein temperature of the atmosphere in the dust cover of a resist coating device is restrained from rising CONSTITUTION:Cooling gas controlled at specified low temperature is fed from a gas supply source 18 through a duct 17 provided on a dust cover 7 so that the atmosphere in the duct cover 7 may be agitated to restrain the atmospheric temperature from rising by heating a chuck 2. Through these procedures, uneven drying of resist solution R coated on the surface of a wafer 1 can be prevented from occurring enabling an even resist thin film to be formed.
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Citations
Patent
SOG coated apparatus to solve SOG non-uniformity in the VLSI process
Yung-Haw Liaw,Hsin-Chieh Huang,Pao-Ling Kuo +2 more
- 01 Dec 1994
TL;DR: In this paper, an apparatus for applying spin-on-glass material to a wafer under controlled humidity conditions is described, the apparatus comprises a treatment chamber consisting of a spin on-glass coater spin table, a plurality of hotplates connected to one another and a moving belt.
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Patent
Cooling water passage structure of engine
Tomio Dobashi,Tanaka Takeshi,富生 土橋,豪 田中 +3 more
- 07 Sep 2007
TL;DR: In this article, the first-to-third internal cooling water passages of a cylinder head are opened on an outer wall surface of the cylinder head by bolts 31, 32 and 33.
4
Patent
Liquid crystal sheet thermometer
Endo Hiroyuki,Kenji Hashimoto,Uchida Toshiharu +2 more
- 08 Apr 1991
TL;DR: In this paper, the authors measured the response time when a dipole is inverted in ferroelectric phase from the peak of a polarization inverting current, using data on the temperature and response time.
2
Patent
Method and apparatus for coating application
Yamanaka Koji
- 20 Dec 1990
TL;DR: In this paper, an object is held by suction on a spin chuck and a sprayer is used to adjust the temp. of the object being coated using an infrared detector.
1
References
Patent
Heat treatment device
Haruo Amada,Hiroshi Ikeda +1 more
- 13 Aug 1980
TL;DR: In this paper, a treating chamber for heat treatment of a wafer, with a gas circulating passage designed for allowing clean gas to pass downwards, was provided to improve production yield by preventing foreign matters from adhering to the wafer and keeping gas pressure in the treating chamber to positive pressure in comparison with atmospheric pressure.
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