Patent
Recognition pattern learning system
Kachi Masamiki
- 12 Aug 1983
2
About: The article was published on 12 Aug 1983.
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Citations
Patent
Vapor growth apparatus
Okamoto Akihiko,Terao Hiroshi +1 more
- 24 Jul 1986
TL;DR: In this paper, a gas of etching property was applied to prevent the generation of a deposit to the inner wall of the reaction tube of the substrate placing region by heating this portion to a high temperature, thereby causing all the reaction byproducts to flow out as a volatile gas together with the gas passed the substrate portion.
1
References
Patent
Voice recognition system
Hiroya Fujisaki,Yukio Nakai,Yasuo Sato,Hidekazu Shiratori,Osamu Terao +4 more
- 24 May 1976
TL;DR: In this article, a system with high reliability which does not cause any erroneous recognition is presented, by registering beforehand the parameter of the vowel included in the word to be recognized, without causing erroneous recognition.
25
Patent
Pattern pretreatment method in voice identifier
Hataoka Nobuo,Akira Ichikawa,Kitazume Yoshiaki,Eiji Oohira +3 more
- 21 Dec 1979
6
Patent
Sound signal handling system in acoustic device
Masayuki Iida,Kiyoshi Tajima,Hiroki Oonishi +2 more
- 04 Oct 1979
5