Journal Article10.1116/1.4943385
Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes
David H. K. Jackson,Masihhur R. Laskar,Shuyu Fang,Shenzhen Xu,Ryan G. Ellis,Xiaoqing Li,Mark Dreibelbis,Susan E. Babcock,Mahesh K. Mahanthappa,Dane Morgan,Robert J. Hamers,Thomas F. Kuech +11 more
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TL;DR: In this paper, a self-limited ALD growth mode was found when the deposition temperature was reduced to 125°C, and the TaF5 exposures were followed by an extended purge.
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Abstract: Atomic layer deposition (ALD) of conformal AlF3 coatings onto both flat silicon substrates and high-voltage LiNi0.5Mn0.3Co0.2O2 (NMC) Li-ion battery cathode powders was investigated using a Al(CH3)3/TaF5 precursor combination. This optimized approach employs easily handled ALD precursors, while also obviating the use of highly toxic HF(g). In studies conducted on planar Si wafers, the film's growth mode was dictated by a competition between the desorption and decomposition of Ta reaction byproducts. At T ≥ 200 °C, a rapid decomposition of the Ta reaction byproducts to TaC led to continuous deposition and high concentrations of TaC in the films. A self-limited ALD growth mode was found to occur when the deposition temperature was reduced to 125 °C, and the TaF5 exposures were followed by an extended purge. The lower temperature process suppressed conversion of TaFx(CH3)5−x to nonvolatile TaC, and the long purges enabled nearly complete TaFx(CH3)5−x desorption, leaving behind the AlF3 thin films. NMC cathod...
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Citations
Atomic and molecular layer deposition: off the beaten track
TL;DR: A review of the recent developments of ALD and MLD of materials that are gaining increasing attention on various substrates, with particular emphasis on high-surface-area substrates and a critical review ofthe effects of the process conditions, namely, temperature, pressure, and time on ALD growth.
213
Atomic/molecular layer deposition for energy storage and conversion.
Yang Zhao,Lei Zhang,Jian Liu,Keegan R. Adair,Feipeng Zhao,Yipeng Sun,Tianpin Wu,Xuanxuan Bi,Khalil Amine,Jun Lu,Xueliang Sun +10 more
TL;DR: A comprehensive review of the development and achievements of ALD and MLD and their applications for energy storage and conversion, including batteries, supercapacitors, fuel cells, solar cells, and photoelectrochemical water splitting, is given in this paper.
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Atomic Layer Deposited MgO: A Lower Overpotential Coating for Li[Ni0.5Mn0.3Co0.2]O2 Cathode
Masihhur R. Laskar,David H. K. Jackson,Shenzhen Xu,Robert J. Hamers,Dane Morgan,Thomas F. Kuech +5 more
TL;DR: Cyclic voltammetry studies suggested that ALD MgO has a higher Li-diffusion coefficient which resulted in lower overpotential on the NMC cathode surface and improved Li-ion battery rate performance, which yielded improved capacity retention over uncoated NMC in a long-range cycling test.
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Ab Initio Modeling of Electrolyte Molecule Ethylene Carbonate Decomposition Reaction on Li(Ni,Mn,Co)O2 Cathode Surface
Shenzhen Xu,Guangfu Luo,Ryan Jacobs,Shuyu Fang,Mahesh K. Mahanthappa,Robert J. Hamers,Dane Morgan +6 more
TL;DR: This work implies that the possible rate-limiting steps of the electrolyte molecule decomposition are the reactions on the decomposed organic products on the cathode surface rather than on the bare cathodes, which is commonly used in commercial Li-ion batteries.
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Coating Solution for High-Voltage Cathode: AlF3 Atomic Layer Deposition for Freestanding LiCoO2 Electrodes with High Energy Density and Excellent Flexibility.
TL;DR: By elimination of the unnecessary weight of current collector, and increasing in the working voltage simultaneously, this freestanding LCO-MWCNT-NCF electrode can significantly improve the gravimetric and volumetric energy density of lithium ion batteries.
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References
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
TL;DR: In this paper, the surface chemistry of the trimethylaluminum/water ALD process is reviewed, with an aim to combine the information obtained in different types of investigations, such as growth experiments on flat substrates and reaction chemistry investigation on high-surface-area materials.
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Coking- and Sintering-Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition
Junling Lu,Baosong Fu,Mayfair C. Kung,Guomin Xiao,Jeffrey W. Elam,Harold H. Kung,Peter C. Stair,Peter C. Stair +7 more
TL;DR: It is shown that alumina (Al2O3) overcoating of supported metal nanoparticles (NPs) effectively reduced deactivation by coking and sintering in high-temperature applications of heterogeneous catalysts.
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Novel lithium insertion material of LiCo1/3Ni1/3Mn1/3O2 for advanced lithium-ion batteries
Naoaki Yabuuchi,Tsutomu Ohzuku +1 more
TL;DR: In this article, LiCo 1/3 Ni/NiO 2 with electrolyte was used for advanced lithium-ion battery insertion and showed that the exothermic reaction was milder than that of NiO 2 or CoO 2.
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Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li‐Ion Batteries
Yoon Seok Jung,Yoon Seok Jung,Andrew S. Cavanagh,Leah A. Riley,Sun-Ho Kang,Anne C. Dillon,Markus D. Groner,Steven M. George,Se-Hee Lee +8 more
TL;DR: It is clearly demonstrated that conformal ultrathin protective coating by inactive metal oxide without disrupting inter-particle electronic pathway can be realized by atomic layer deposition (ALD) directly performed on a composite electrode, which leads to significant improvement of both long-term durability and safety of NG anode.