Patent
Negative resist composition
Ryoichi Takasu,Miwa Miyairi,Jun Iwashita,Tachikawa Toshikazu +3 more
- 25 Jun 2003
189
TL;DR: In this paper, a negative resist composition is provided which is less likely to swell in an alkali developing solution, where a compound (A) which generates an acid upon exposure to radiation, and a resin component (B) which becomes insoluble in alkali under the action of an acid, is presented.
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Abstract: A negative resist composition is provided which is less likely to swell in an alkali developing solution. An alkali-developable negative resist composition is disclosed comprising a compound (A) which generates an acid upon exposure to radiation, and a resin component (B) which becomes insoluble in alkali under the action of an acid, wherein the component (B) is a resin component containing: (b1) a unit which becomes insoluble in an alkali solution as a result of the formation of a lactone under the action of an acid generated from the component (A), and (b2) a unit having an alcoholic hydroxyl group.
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Citations
Patent
Positive resist composition and pattern-forming method using the same
Hiromi Kanda
- 13 Sep 2006
TL;DR: In this article, the authors defined a positive resist composition comprising at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation.
536
Patent
Radiation-sensitive resin composition
Mitsuhito Suwa,Haruo Iwasawa,Toru Kajita,Shin-Ichiro Iwanaga +3 more
- 12 Dec 1997
TL;DR: A radiation sensitive resin composition comprising a fluorine-containing copolymer of hexafluoropropylene, at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carbonyl anhydrides, and an unsaturated compound (B) an acid generating compound which generates an acid upon exposure to radiation; (C) a crosslinkable compound; and (D) an organic solvent.
484
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Method for Manufacturing Semiconductor Device
Hidekazu Miyairi,Koichiro Tanaka,Hironobu Shoji,Shunpei Yamazaki +3 more
- 29 Jun 2007
TL;DR: In this article, the authors proposed a method for manufacturing a semiconductor device, in which the number of photolithography steps can be reduced, the manufacturing process can be simplified, and manufacturing can be performed with high yield at low cost.
323
Patent
Resist composition and patterning process
Jun Hatakeyama
- 14 Feb 2012
TL;DR: In this article, a resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent, which overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.
280
Patent
Resist material and pattern forming method
Satoshi Watanabe
- 21 Feb 2001
TL;DR: In this paper, a pattern-forming method was proposed for PED-stabilizer-containing resist material having high sensitivity and high resolution, and sufficient PED stability, provided that the resist material contains at least one compound selected from thiol derivatives, disulfide derivatives and thiolsulfonate derivatives.
227
References
Patent
Thermal digital lithographic printing plate
Celin Savariar-Hauck,Ken-Ichi Shimazu,Hans-Joachim Timpe,Jayanti Patel,Jianbing Huang +4 more
- 22 Dec 1999
TL;DR: A thermally imageable element, useful as a lithographic printing plate precursor is disclosed in this paper, which comprises a hydrophilic substrate; an underlayer comprising a first polymeric material; and an ink-receptive top layer comprising a second polymeric materials and a solubility-suppressing component.
172
Patent
Negative resist material and method for forming resist pattern
Jyun Iwashita,Tachikawa Toshikazu +1 more
- 25 Mar 2004
TL;DR: In this paper, a negative-working resist material comprising a polymeric compound having a polymerizable unit comprising at least a hydroxy acid moiety and a main chain moiety bound to each other via only one carbon in the carbon skeleton of the acid, wherein a space of such size as to permit an alkali substance to approach a linkage between the polymeric mixture and the main chain is not present between the two moieties.
154
Patent
Negative radiation-sensitive resin composition
Kouji Nishikawa,Tooru Kimura,Shinichiro Iwanaga +2 more
- 24 Mar 2005
TL;DR: In this paper, a negative radiation-sensitive resin composition comprising a polymer containing structural units represented by the following formulas (1) and/or the following formula (2), a compound having at least one ethylenically unsaturated double bond and (C) a radiation sensitive radical polymerization initiator, and by forming the negative radiation sensitive resin film using the composition.
102
Patent
Negative-working photoresist composition
Hideo Hada,Iwai Takeshi,Satoshi Fujimura +2 more
- 08 Nov 2004
TL;DR: In this paper, a negative-working photoresist was used for photolithographic patterning in the manufacture of semiconductor devices suitable for patterning light-exposure to ArF excimer laser beams and capable of giving a high-resolution patterned resist layer free from swelling and having an orthogonal cross sectional profile by alkali-development.
47
Patent
Fluorine-containing polymerisable monomer and polymer prepared by using same
Satoru Miyazawa,Kazuhiko Maeda,Kenji Tokuhisa,Shoji Arai +3 more
- 30 Jun 2004
TL;DR: In this paper, the present invention relates to a polymerizable monomer represented by the general formula (1), wherein R1 is a hydrogen atom, a halogen atom, or a hydrocarbon group or a fluorine-containing alkyl group, and n is an integer of 1-2.
46
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