Patent
Methods for patterning using liquid embossing
Colin Bulthaup,Chris Spindt +1 more
- 20 Sep 2002
85
TL;DR: In this article, the first mask structure is formed by depositing a layer of a first material onto the surface or layer and embossing the layer with a micro-stamp structure.
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Abstract: The current invention is directed to a method of patterning a surface or layer in the fabrication of a micro-device. In accordance with a preferred embodiment of the invention, a first mask structure is formed by depositing a layer of a first material onto the surface or layer and embossing the layer with a micro-stamp structure. The layer is preferably embossed as a liquid, which is solidified or cured to form the first mask structure. The first mask structure can be used as an etch-stop mask which is removed in a subsequent processing step or, alternatively, the first mask structure can remain a functional layer of the micro-device. In further embodiments, unmasked regions of the surface or layer are chemically treated through the first mask structure and/or a second material is deposited onto the unmasked regions of the surface or layer through the first mask structure to form a second mask structure and/or a second functional layer of the micro-device.
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Citations
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Ralph G. Nuzzo,John A. Rogers,Etienne Menard,Keon Jae Lee,Dahl-Young Khang,Yugang Sun,Matthew Meitl,Zhengtao Zhu +7 more
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- 20 Sep 2007
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Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
Joseph M. DeSimone,Jason P. Rolland,Ansley E. Exner,Edward T. Samulski,R. Jude Samulski,Benjamin W. Maynor,Larken E. Euliss,Ginger M. Denison +7 more
- 20 Dec 2004
TL;DR: In this paper, the use of fluorinated elastomer-based materials in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, was described.
271
References
Unconventional Methods for Fabricating and Patterning Nanostructures.
TL;DR: Lithography with Neutral Metastable Atoms 1838 4.1.
1.6K
Patent
Formation of microstamped patterns on surfaces and derivative articles
Amit Kumar,George M. Whitesides +1 more
- 04 Oct 1993
TL;DR: In this article, a method of patterning a material surface is provided in which an elastomeric stamp having a stamping surface is coated with a self-assembled monolayer forming species having a functional group selected to bind to a particular material.
765
Step and flash imprint lithography: a new approach to high-resolution patterning
Matthew E. Colburn,Stephen C. Johnson,Michael D. Stewart,S. Damle,Todd Bailey,Bernard Choi,M. Wedlake,Timothy Michaelson,Sidlgata V. Sreenivasan,John G. Ekerdt,C. Grant Willson +10 more
- 25 Jun 1999
TL;DR: In this article, a template is created on a standard mask blank by using the patterned chromium as an etch mask to produce high-resolution relief images in the quartz.
Patent
Electronically addressable microencapsulated ink and display thereof
Joseph M. Jacobson
- 20 Aug 1996
TL;DR: In this paper, the authors describe a system of electronically active inks which may include electronically addressable contrast media, conductors, insulators, resistors, semiconductive materials, magnetic materials, spin materials, piezoelectric materials, optoelectronic or radio frequency materials.
563
Patent
Fabrication of finely featured devices by liquid embossing
Joseph M. Jacobson,Colin Bulthaup,Eric Wilhelm,Brian N. Hubert +3 more
- 13 Sep 2000
TL;DR: Elastomeric stamps facilitate direct patterning of electrical, biological, chemical, and mechanical materials as discussed by the authors, where a thin film of material is deposited on a substrate, either originally present as a liquid or subsequently liquefied, is patterned by embossing at low pressure using a raised pattern.
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