Patent
Method and device for separating diffracted light
Suzuki Masanori,Une Atsunobu +1 more
- 16 Jul 1988
2
TL;DR: In this paper, the authors proposed a method to easily separate diffracted light beams from diffraction gratings which are arranged nearby by converging or diverging a laser beam projected on the gratings by an exposure device which utilizes an optical heterodyne interference method.
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Abstract: PURPOSE:To easily separate diffracted light beams from diffraction gratings which are arranged nearby by converging or diverging a laser beam projected on the diffraction gratings by an exposure device which utilizes an optical heterodyne interference method CONSTITUTION:A laser beam outputted by a two-wavelength orthogonal polarized light laser beam source 1 is passed through a cylindrical lens 3 to become an elliptic beam, which is split by a polarization beam splitter 4 into beams which differ in wavelength and are made incident on mirrors 5a and 5b Condenser lenses 31a and 31b are arranged in front of reflection type diffraction gratings 7 and 9, so the incident beam 31 and 33 incident on the diffraction gratings 7 and 9 are divergent beams Consequently, the diffracted beam 34 and 35 from the gratings are divergent beams, which are separated as they leave the diffraction gratings 7 and 9 Consequently, even when both diffraction gratings 7 and 9 are arranged closely to each other, their diffracted beams can be detected separately and independently with ease
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Citations
Patent
Mask, exposure apparatus and device manufacturing method
Yuichi Shibazaki
- 06 Mar 2009
TL;DR: In this paper, a circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system, where the mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction.
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Patent
Alignment optical system
Masaki Yamamoto,Takeo Sato,Shinichiro Aoki,Yamaguchi Katsumasa +3 more
- 29 Mar 1990
TL;DR: In this article, a beam projecting optical system is inclined in the direction perpendicular to the misalignment detecting direction so as to make the beam obliquely incident and the aperture which can cut the multiple interference light between the mask 3 and the wafer 4 is provided on a mark.
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