Mask pattern for exposing and exposing device and pattern correcting device

TL;DR: In this article, a mask pattern for exposing is provided with liquid crystals disposed flatly with many cells in a matrix form on the glass mask and forms the patterns of the shapes assigned by forming the arbitrary cells so as to have light transmittability or reflectivity by a liquid crystal control system.

Abstract: PURPOSE:To allow the prompt formation of desired patterns and to provide the exposing device which eliminates the need for producing a fresh glass mask for exposing at the time of producing a trial product as well as to provide the pattern correcting device which allows the obtaining of the mask patterns for correction not as drawings and program data but as an original plate for the glass mask and allows the correction of the arbitrary glass mask for exposing. CONSTITUTION:This mask pattern for exposing is provided with liquid crystals disposed flatly with many cells in a matrix form on the glass mask and forms the patterns of the shapes assigned by forming the arbitrary cells so as to have light transmittability or reflectivity by a liquid crystal control system. A light source which uses the mask pattern for exposing and generates parallel rays of light and a laser generator which generates the light source are provided. This pattern correcting device uses the above-mentioned mask pattern for exposing as the mask pattern for correction and is provided with a light source which generates the parallel rays of light to the glass mask for exposing and the mask pattern for exposing, respectively, and a laser generator which generates this light source.