Patent
Liquid crystal sheet thermometer
Endo Hiroyuki,Kenji Hashimoto,Uchida Toshiharu +2 more
- 08 Apr 1991
2
TL;DR: In this paper, the authors measured the response time when a dipole is inverted in ferroelectric phase from the peak of a polarization inverting current, using data on the temperature and response time.
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Abstract: PURPOSE:To find accurate temperature with good response by applying a rectangular or triangular voltage, measuring the response time when a dipole is inverted in ferroelectric phase from the peak of a polarization inverting current, and using data on the temperature and response time. CONSTITUTION:When a control means 41 commands a voltage applying means 20 to apply a voltage to a specific position of a sheet type temperature sensing means 10, an applying means 20 applies the rectangular wave, etc., to an electrode line corresponding to the specific position between electrodes 14 and 15 according to the command. When the rectangular wave voltage, etc., is applied from the applying means 20, the dipole of liquid crystal molecules of the liquid crystal cell at the part applied with the voltage is inverted as the polarity of the voltage is varied so that the polarization inverting current flows to the liquid crystal cell. A current variation measuring means 30 measures the current polarization inverting current and sends the result to the calculation part 42 of a processing part 40. The calculation part 42 finds the response speed tm or tw of the liquid crystal cell from the current variation sent from a varying means 30 and finds the temperature corresponding to the response speed tm or tw from the response-speed/temperature characteristic data of the ferroelectric high polymer liquid crystal which is stored previously in a data storage means 43.
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Citations
Patent
Coating apparatus, thin film forming method, thin film forming apparatus, and semiconductor device manufacturing method, electro-optic device and electronic instrument
Ichio Yudasaka
- 05 Apr 2004
TL;DR: In this paper, the authors describe a liquid-supply system for thin-film forming in a substrate in a coating chamber, where a first liquid supply system that supplies the liquid material is provided in the coating chamber.
43
Patent
Liquid crystal device, temperature detection method and electronic device
Mizusako Kazuhisa,Toyooka Takashi +1 more
- 16 Jun 2011
TL;DR: In this paper, the authors proposed a method to detect the temperature of a liquid crystal layer of a LAM without any limitation on mounting, using a temperature output circuit that computes temperature information of the LAM from voltage generated between both ends of the resistance element 60, that is, a value obtained by multiplying a resistance value by a current flowing through the liquid crystal layers.
References
Patent
Conveyor for wafer
Maeda Yorihisa,Suzuki Takashi,Yamamoto Shigeyuki +2 more
- 29 Nov 1985
TL;DR: In this paper, the authors proposed a method to prevent an adhesion onto a wafer of impurities by mounting a plurality of holding fixtures holding the peripheral section of the back of the wafer and a holding-fixture drive for passing between gas discharge means from upper and lower sections.
5
Patent
Resist coating device
Akihiko Shiguma,Yoshiyuki Maeda +1 more
- 24 Aug 1987
TL;DR: In this article, the authors proposed a method to form a uniform resist thin film on the surface of a wafer by a method wherein temperature of the atmosphere in the dust cover of a resist coating device is restrained from rising.
4
Patent
Apparatus for applying resist
Tanaka Akira
- 26 Aug 1983
TL;DR: In this article, the authors proposed a method to eliminate the adhesion of a resist to the back surface of a wafer by minimizing the top-end flat part, to which the resist adheres, of a guide tube coming close to the surface of the wafer.
2
Patent
Wafer processor for manufacture of semiconductor element
Horusuto Kuntsueekonsebuitsuts,Hansu Miyuraa-Uuri +1 more
- 27 Dec 1988
2
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