Patent
Ingot cutting method with wire saw
Kobayashi Tatsunobu,Kitamura Yoshiki,Sugitani Kazuaki,Fujiwara Susumu,Kiyama Takumi +4 more
- 02 Mar 1999
3
TL;DR: In this paper, the problem of reducing the warp of the wafer wafer was addressed by reducing the unevenness of the thickness of a wafer, increasing the yield of wafer per ingot, and reducing warp.
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Abstract: PROBLEM TO BE SOLVED: To shorten the cutting time of an ingot, reduce the unevenness of the thickness of a wafer, increase the yield of the wafer per ingot and also reduce the warp of the wafer. SOLUTION: A feed amount per cycle of the go and return of a wire row 11 is made comparatively larger at the cutting start end and cutting final end of the ingot I and comparatively smaller at the cutting central part of the ingot I. As this result, total idle time of the cutting start end and final end with a short contact length to the ingot I an be shortened and the ingot cutting time is shortened. At the same time, the ingot can be cut smoothly with causing the run-out of lubrication of an abrasive liquid at the cutting central part with a long contact length. The unevenness of the thickness of the wafer W just after cutting can be reduced and the yield of the wafer production can be increased. The warp of the wafer W can be reduced and the break of the wafer W and wire disconnection at the lapping time can be prevented, too.
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Citations
Patent
Method for operating a wire saw device
Coustier Fabrice,Ferreiro Roberto,Mottas Philippe,Bornet Frederic,Luyckx Luc,Van Der Meer Mathijs Pieter +5 more
- 24 Mar 2011
TL;DR: In this paper, a wire use cycle is described for wire saws, which includes in the following order: (a) accelerating the wire to a first moving speed in a first movement direction and moving the wire for a first distance of at least 50 m, (b) stopping the wire movement, (c) accelerating a second moving speed opposite to the first direction, and (d) stopping a wire movement for a second distance wherein one of the first distance and the second distance is 20 % or less greater than the other distance.
4
Patent
Cutting method and bar sticking tool for polygonal structural size silicon wafer
Hu Lifeng,Wang Xinping +1 more
- 18 Jul 2017
TL;DR: In this paper, a cutting method and a bar sticking tool for a polygonal structural size silicon wafer are presented. But the method is not suitable for the use of high-dimensional data.
2
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