Influence of Deposition Parameters for Cu2O and CuO Thin Films by Electrodeposition Technique: A Short Review
TL;DR: In this paper , the transition metal oxide-based nanomaterial attracted researchers for its various applications due to its interesting physical, chemical, and optical properties, such as good electrical conductivity, and various nanostructure morphologies with the environment-friendly constituents.
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Abstract: The transition metal oxide-based nanomaterial attracted researchers for its various applications due to its interesting physical, chemical, and optical properties. Copper oxide thin films with different oxidation states were prepared on various transparent, nontransparent nature conducting substrates from the acidic and alkaline medium by electrodeposition technique. The deposition parameters such as potential, bath temperature, solution pH, and deposition time determine the physical, chemical, and optical properties. The complexing agents such as sodium thiosulfate, lactic acid, citric acid, and triethanolamine determine the stability of cuprous and cupric ions in the deposited films. Optical properties reported that the deposited films have direct band gap value 1.3 and 3.7 eV represents the absorbance of the deposited films in the visible region of solar spectrum. The absorbance of light in visible region, good electrical conductivity, and various nanostructure morphologies with the environment-friendly constituents are the distinctive properties of copper metal oxides.
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Citations
pH-dependent deposition of Cu₂O thin films: tuning defect states and electronic properties for improved energy conversion applications
A. Adel,Redouani Locif,Ibrahim Yaacoub Bouderbala,Herbadji Abdelmadjid,Rabhi Selma,Bouras Imed-Eddine +5 more
Harnessing g-C3N4 and rGO synergistic effects for superior photocatalysis in CuO/NiO nanocomposite
Sethuramachandran Thanikaikarasan,Lalitha Gnanasekaran,Perumal Veeramalai Chandrasekar,M. A. Sayed,Mohd Shkir +4 more
Supercapacitor properties of Cu2O/Cu(OH)2 composite thin films deposited on nickel foam using pulse reverse potential electrodeposition
Angshuman Sarkar,Berti Chilton Taguessong,X.-Grant Chen,D. K. Sarkar +3 more
Cobalt Decoration on Cu₂O Photocatalyst via Electrodeposition for Enhanced Methylene Blue Degradation
Bella Pricilya,Nindys Aprillia,Shyla Noureen Zahra,Firgie Wulandari,Faisal Abnisa,Bella Pricilya,Nindys Aprillia,Shyla Noureen Zahra,Firgie Wulandari,Faisal Abnisa +9 more
Abstract: Cuprous oxide (Cu₂O) is a promising material for photocatalysis due to its narrow bandgap, cost-effectiveness, and non-toxicity. However, its practical application is hindered by the rapid recombination of electron-hole pairs and low stability. This study addresses these limitations by decorating Cu₂O film with a cobalt (Co) cocatalyst. The Cu₂O/Co film was successfully synthesized on indium tin oxide (ITO) substrate through electrodeposition. Characterisation results confirmed the presence of small, agglomerated Co deposits that scattered on Cu2O grain boundaries. Electrochemical impedance spectroscopy showed that Cu₂O/Co exhibited a charge transfer resistance of 21.94 Ω, which is lower compared to Cu₂O at 24.16 Ω. This indicates that the addition of Co enhances interfacial charge transfer kinetics. Photodegradation test of Cu₂O with Co then revealed a higher degradation efficiency of 76.51% than that of Cu₂O film at 67.55%, highlighting the potential of Co as a cocatalyst for Cu2O.
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