Journal Article10.1111/J.1151-2916.1989.TB06298.X
Hot Isostatic Press Sintering and Properties of Silicon Nitride without Additives
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TL;DR: In this article, the sintering process of highly pure powder was investigated with special interest in the evolution of α-β phase transformation, densification, and microstructure development, and it was observed that the transformation occurred without a liquid phase below 1730°C, which corresponds to the melting point of SiO2.
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Abstract: Fully densified silicon nitride without additives was fabricated by means of hot isostatic pressing. The sintering process of highly pure powder was investigated with special interest in the evolution of α–β phase transformation, densification, and microstructure development. It was observed that the transformation occurred without a liquid phase below 1730°C, which corresponds to the melting point of SiO2. Above 1730°C, the densification and β-grain elongation accelerated concurrently because of the appearance of liquid SiO2. However, full densification was attained at 1950°C together with marked grain growth. Flexural strength, microhardness, fracture toughness, and Young's modulus of sintered bodies were measured as a function of temperature. In the sintered body started from highly pure powder, excellent MOR behavior was found up to 1400°C. Impurity content of a few hundred ppm was found to be sufficient to make densification easy and to degrade high-temperature strength.
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Citations
Silicon Nitride for High‐Temperature Applications
TL;DR: In this article, a summary of the development of high-temperature silicon nitride (T>1200°C) is provided, where the influence of various sintering additive systems is evaluated with focus on the high temperature potential of the resulting materials.
427
Ceramics and Ceramic Coatings in Orthopaedics
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200
Calcium Concentration Dependence of the Intergranular Film Thickness in Silicon Nitride
Isao Tanaka,Isao Tanaka,Hans-Joachim Kleebe,Hans-Joachim Kleebe,Michael K. Cinibulk,Michael K. Cinibulk,John Bruley,John Bruley,David R. Clarke,David R. Clarke,Manfred Rühle,Manfred Rühle +11 more
TL;DR: In this paper, high-resolution electron microscopy and nano-beam analytical electron microscope were used to characterize both the intergranular silicate film thickness and its local composition in a series of high-purity Si3N4 ceramics doped with 0.450 at. ppm Ca.
180
Silicon Nitride—From Powder Synthesis to Ceramic Materials
TL;DR: Deville et al. as discussed by the authors presented an overview of the properties required for Si3N4 powders suitable for advanced ceramics, as well as the manufacturing processes and material properties.
156
Progress in silicon-based non-oxide structural ceramics
Wolfgang Dressler,Ralf Riedel +1 more
TL;DR: In this paper, the progress in monolithic Si3N4 and SiC as well as in Si 3N4/SiC-composites for structural applications is reviewed.
146
References
Relationships between processing, microstructure and properties of dense and reaction-bonded silicon nitride
TL;DR: In this paper, the relationship between powder properties, process conditions, densification and microstructure, as well as the interdependence between microstructures and properties is discussed.
759
Si3N4 and Si2N2O for high performance radomes
TL;DR: Si3N4 is a suitable material for high temperature radome applications because of its good thermomechanical and dielectric properties The process parameters employed in pressureless sintering to obtain high density material were investigated as discussed by the authors.
126
Formation of silicon oxinitride from Si3N4 and SiO2 in the presence of Al2O3
TL;DR: In this paper, the formation of Si 2 N 2 O from SiO 2 and α-Si 3 N 4 powder mixtures with addition of 3 mol % Al 2 O 3 was investigated.
102