Journal Article10.1116/1.569625
High‐precision automatic alignment procedure for vector scan e‐beam lithography
D. Stephani,E. Fröschle +1 more
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TL;DR: In this paper, an automatic alignment procedure for two successive exposure levels of better than ±50 nm in a deflection field of 600 μm at a beam current of 5×10−10 A within an average time of 3 s was described.
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Abstract: The described automatic alignment procedure permits an alignment of two successive exposure levels of better than ±50 nm in a deflection field of 600 μm at a beam current of 5×10−10 A within an average time of 3 s even without using a laser interferometer controlled stage.
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