Journal Article10.1557/s43578-021-00371-7
First-principles calculations of structural, electrical, and optical properties of ultra-wide bandgap (Al$$_x$$Ga$$_{1-x}$$)$$_2$$O$$_3$$ alloys
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About: This article is published in Journal of Materials Research. The article was published on 13 Sep 2021.
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Citations
MOCVD Growth of β-Ga2O3 on (001) Ga2O3 Substrates
Lingyu Meng,Hsien-Lien Huang,Chris Chae,Jinwoo Hwang,Hongping Zhao +4 more
- 10 Apr 2024
TL;DR: Researchers investigated MOCVD growth of β-Ga2O3 on (001) Ga2O3 substrates using TEGa and TMGa precursors, optimizing growth conditions to achieve high mobility (85 cm2/V s) and low carrier concentration (2.0 × 10^17 cm^-3) with minimal cracking and carbon contamination.
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Solid‐Solution Limits and Thorough Characterization of Bulk β‐(Al<sub>x</sub>Ga<sub>1‐x</sub>)<sub>2</sub>O Single Crystals Grown by the Czochralski Method
Zbigniew Galazka,Andreas Fiedler,Andreas Popp,Palvan Seyidov,Saud Bin Anooz,Roberts Blukis,Jana Rehm,Kornelius Tetzner,Mike Pietsch,A. Dittmar,Steffen Ganschow,A. Akhtar,T. Remmele,M. Albrecht,Tobias Schulz,Ta‐Shun Chou,Albert Kwasniewski,Manuela Suendermann,Thomas Schroeder,Matthias Bickermann +19 more
TL;DR: The solid-solution limit of β-(AlxGa1-x)2O single crystals grown by Czochralski method is achieved at [Al] = 40 mol%, resulting in the formula of β-(Al0.4Ga0.6)2O3. Single crystalline and monoclinic phase is preserved up to this limit.
Electrical conductivity, luminescence, and deep acceptor levels in β-Ga2O3-In2O3 polycrystalline solid solution doped with Zr4+ or Ca2+ ions
A. Luchechko,V. Vasyltsiv,M. O. Kushlyk,L. Kostyk,D. P. Slobodzyan +4 more
- 20 Mar 2024
TL;DR: Electrical conductivity, luminescence, and deep acceptor levels in β-Ga2O3-In2O3 polycrystalline solid solution doped with Zr4+ or Ca2+ ions are studied. Samples exhibit high luminescence and low electrical conductivity. The luminescence arises from the radiative recombination of charge carriers through donor–acceptor pairs and self-localized holes.
Comparison of Ti/Au, Ni/Au, and Sc/Au ohmic contact metal stacks on (Al0.18Ga0.82)2O3
Hsiao-Hsuan Wan,Chao-Ching Chiang,Jian-Sian Li,F. Ren,Fikadu Alema,A. Osinsky,V. Crăciun,S. J. Pearton +7 more
References
Next generation electronics on the ultrawide-bandgap aluminum nitride platform
Austin Hickman,Reet Chaudhuri,Samuel James Bader,Kazuki Nomoto,Lei Li,James C. M. Hwang,Huili Grace Xing,Debdeep Jena +7 more
TL;DR: In this article, the authors proposed the shift to the aluminum nitride (AlN) platform, which allows for smarter, highly-scaled heterostructure design that will improve the output power and thermal management of III-nitride amplifiers.
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First-principles surface energies for monoclinic Ga 2 O 3 and Al 2 O 3 and consequences for cracking of (Al x Ga 1-x ) 2 O 3
TL;DR: In this paper, the authors employed first-principles calculations to determine the brittle fracture toughness of (AlxGa1−x)2O3 epitaxial films for three growth orientations of the monoclinic structure: [100], [010], and [001].
Low 1014 cm−3 free carrier concentration in epitaxial β-Ga2O3 grown by MOCVD
Fikadu Alema,Yuewei Zhang,Andrei Osinsky,Nazar Orishchin,Nicholas Valente,Akhil Mauze,James S. Speck +6 more
TL;DR: In this article, a low free carrier concentration of 153 cm2/V s was reported for MOCVD-grown β-Ga2O3 with excellent electron mobility, which was attributed to the compensation of Si at the film/substrate interface by N, which acts as a deep acceptor.
79
Evaluation of band alignment of α-Ga2O3/α-(Al x Ga1− x )2O3 heterostructures by X-ray photoelectron spectroscopy
TL;DR: In this article, the authors evaluated the type-I band alignment at an α-Ga2O3/α-(Al x Ga1− x ) 2O3 heterointerface, with different Al compositions (x), grown on a c-plane sapphire substrate was evaluated by X-ray photoelectron spectroscopy.
64
Determination of the thermal expansion of κ-Al2O3 by high temperature XRD
TL;DR: In this article, the thermal expansion of κ -Al 2 O 3 has been characterised using high temperature X-ray diffraction of the powder obtained from crushed chemical vapour deposited κ-Al 2O 3 coatings.
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