Patent
Exposure apparatus and method of cleaning optical element of the same
Tomoharu Hase,Yukio Yamane +1 more
- 08 Jun 2001
51
TL;DR: An exposure apparatus for exposing a substrate to a pattern of a mask by use of exposure light is described in this article, which includes an optical system for directing the exposure light from a light source to the substrate, the optical system having an optical element, a first casing for accommodating therein an optical surface of the optical element and a second casing, and a supplier for supplying an inert gas into the first and second casing through the first port and the second port.
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Abstract: An exposure apparatus for exposing a substrate to a pattern of a mask by use of exposure light. The apparatus includes an optical system for directing the exposure light from a light source to the substrate, the optical system having an optical element, a first casing for accommodating therein an optical surface of the optical element, and a second casing for accommodating therein the optical element and the first casing, a first port provided in the first casing, a second port provided in the second casing, a supplier for supplying an inert gas into the first casing and the second casing, and a supplier for supplying an inert gas into the first casing and the second casing through the first port and the second port.
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Citations
Patent
Lithographic apparatus, and device manufacturing method
Maarten Marinus Johannes Wilhelmus Van Herpen,Vadim Yevgenyevich Banine,Johannes Peterus Henricus De Kuster,Johannes Hubertus Josephina Moors,Lucas Henricus Johannes Stevens,Bastiaan Theodoor Wolschrijn,Yurii Victorovitch Sidelnikov,Marc Hubertus Lorenz Van Der Velden,Wouter Anthon Soer,Thomas Stein,K Kurt Gielissen +10 more
- 28 Jan 2008
TL;DR: In this article, a lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is described, which includes a first radiation dose detector and a second radiation dose detectors, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux.
451
Patent
Exposure apparatus, exposure method, and device manufacturing method
Yutaka Hayashi
- 30 Mar 2001
TL;DR: In this article, a gas supply system that supplies a low absorptive gas with a predetermined purity to the illumination system housing and the barrel of the projection optical system collects the gas exhausted from these closed spaces and supplies the gas to the mask chamber.
228
Patent
Exposure method and apparatus
Takashi Aoki,Naomasa Shiraishi,Soichi Owa +2 more
- 08 Feb 2000
TL;DR: In this article, an exposure apparatus including a projectionoptical system for projecting an image of a pattern (12) on a mask (11) onto a substrate (17) is described.
129
Patent
Lithographic projection apparatus, device manufacturing method and device manufactured thereby
Willem van Schaik,Bastiaan Matthias Mertens,Hans Meiling,Norbertus Benedictus Koster +3 more
- 19 Nov 2001
TL;DR: In this paper, the authors present an in-situ cleaning of optical components for use in a lithographic projection apparatus by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm in the presence of molecular oxygen.
96
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Fluid laser jets, cutting heads, tools and methods of use
Mark S. Zediker,Daryl L. Grubb,Sharath K. Kolachalam,Sam N. Schroit,Ronald A. DeWitt,Charles C. Rinzler,William C. Gray,Paul D. Deutch,Brian O. Faircloth,Yeshaya Koblick,Joel F. Moxley +10 more
- 31 Aug 2011
TL;DR: In this article, high power laser systems, apparatus and methods for performing laser operations in particular in environments where an optically obstructive medium may be present in the laser beam path, such as within the borehole of an oil, gas or geothermal well, or below the surface of a body of water.
89
References
Patent
Projection exposure apparatus
Kenji Nishi
- 23 Feb 2001
TL;DR: In this article, a projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of a mask in the irradiation system or on a plane adjacent to the same and having a center located at the plurality of positions which are eccentric from the optical axis of the system, a
727
Patent
Projection exposure apparatus and method
Kenji Nishi
- 16 May 2000
TL;DR: In this paper, a scanning exposure apparatus and method employ a first masking member to define a width of an illumination area and a second masking members to change the illumination area during movement of a mask and a substrate relative to illumination light during scanning exposure.
296
Patent
Projection exposure apparatus
Futoshi Mori,Masato Takahashi +1 more
- 11 Nov 1998
TL;DR: In this article, an optical system for illumination is divided into a firstoptical system (10A) and a second optical system(10B) for illumination, and a control system (50) compensates for the relative positional deviation between the first and second optical systems by driving the above described actuators.
121
Patent
Illumination control system
TL;DR: In this paper, a control system for precisely controlling an illumination source which forms part of a system is provided, which enables the illumination source to be controlled in accordance with the characteristics of the recording medium, the relative motion between the device and illumination source, the image to be formed on the device, and the dynamics of the system causing the motion of the device between the source and the device.
120
Patent
Projection exposure apparatus
Akikazu Tanimoto,Issei Tanaka,Akira Miyaji +2 more
- 01 Jul 1988
TL;DR: In this paper, a projection exposure apparatus is provided with an optical member, capable of transmitting the exposure light of a first wavelength, placed between a projection optical system and a wafer.
107