Patent
Etching composition and etching process
Masahide Matsubara,Taketo Maruyama +1 more
- 24 May 2007
6
TL;DR: An etching composition which comprises at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid, citric acid and lactic acid is described in this article.
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Abstract: An etching composition which comprises at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid, citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids, a polysulfonic acid compound and water, and an etching process which comprises etching a conductive film comprising zinc oxide as the main component using the etching composition described above.
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Citations
Patent
Etchant and etching process for oxides containing at least indium and gallium
Hidenori Takeuchi,Kunio Yube,Satoshi Okabe,Mari Usui +3 more
- 19 Nov 2013
TL;DR: In this article, an etchant and an etching process were proposed for the etching of oxides containing at least indium and gallium, such as an oxide consisting of indium, gallium and oxygen.
7
Patent
Texture processing liquid for transparent conductive film mainly composed of zinc oxide and method for producing transparent conductive film having recesses and projections
Masahide Matsubara,Satoshi Okabe +1 more
- 05 Oct 2009
TL;DR: In this article, a texture processing liquid for a transparent conductive film for realizing a high photoelectric conversion efficiency in a thin solar cell and a method for producing a transparent conducting film are provided.
3
Patent
Acid chemistries and methodologies for texturing transparent conductive oxide materials
Zhi-Wen Sun,Nitin Kumar,Guizhen Zhang,Minh Anh Nguyen,Nikhil Kalyankar +4 more
- 22 Mar 2010
TL;DR: In this paper, the surface texturing of the transparent conductive oxide (TCO) front contact of a thin-film photovoltaic (TFPV) solar cell is needed to enhance the light-trapping capability of the TFPV solar cells and thus improving the solar cell efficiency.
3
Patent
Liquid composition for etching oxides comprising indium, zinc, tin, and oxygen and etching method
Mari Shigeta,Kunio Yube +1 more
- 21 Jan 2015
TL;DR: In this article, a liquid etching composition that etches an oxide comprising indium, zinc, tin and oxygen at a preferable etching rate, without the etch rate being changed much along with the dissolution of the oxide, and with no substantial generation of deposit, and corrodes wiring materials at such a low level to be ignorable.
3
Patent
Etching liquid and etching method for oxide consisting essentially of zinc, tin and oxygen
Shigeta Mari,Yube Kunio +1 more
- 07 May 2015
TL;DR: In this paper, an etching liquid which has an etch rate that is suitable for etching an oxide consisting essentially of zinc, tin and oxygen, which exhibits little change in etching rate upon dissolution of the oxide, which does not produce precipitates, and by which corrosion of wiring materials is so low as to be unnoticeable.
2
References
Patent
Backlight assembly and display device having the same
Minsoo Choi,Young-sup Kwon +1 more
- 31 Oct 2007
TL;DR: A backlight assembly includes a plurality of blocks and a driving substrate as mentioned in this paper, each of which includes an array of light emitting diodes, and the blocks are fitted to each other.
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Patent
Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures
Cho Won Ho,Gyoo-Chul Jo,Gue-Tai Lee,Jin-Gyu Kang,Beung-Hwa Jeong,Kim Jin Young +5 more
- 05 Mar 2010
TL;DR: An etchant for forming double-layered signal lines and electrodes of a liquid crystal display device includes hydrogen peroxide (H 2 O 2 ), a phosphate, F-ions, an organic acid having a carboxyl group (COOH), a copper (Cu) inhibitor, and a stabilizer.
47
Patent
Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
Ronald James Hopkins,Evan Gower Thomas,Harold J. Kieta +2 more
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TL;DR: In this paper, the improved silicon dioxide etchants are produced by adding soluble perfluornated surfactant additives to standard oxide ensembles in the manufacture of integrated circuits, which are unique because they remain dissolved in the oxide etchant even after 0.2 micron filtration.
46
Patent
Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature
Darryl W. Peters,Irl E. Ward +1 more
- 27 Jan 1999
TL;DR: In this article, the authors present compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues, which are aqueous, acidic compositions containing fluoride and organic polar solvents.
25
Patent
Etching liquid composition
Norio Ishikawa,Kiyoto Mori +1 more
- 05 Sep 2001
TL;DR: In this paper, the etching liquid compositions for transparent conducting films are presented, where foaming is suppressed and residues do not occur after etching, and one or more compounds selected from the group consisting of polysulfonic acid compounds and polyoxyethylene-polyoxypropylene block copolymers.
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