Patent
Etchant and etching method using the same
Taniguchi Wakako,Kawashima Takeshi,Aoyama Tetsuo +2 more
- 11 Dec 2008
5
TL;DR: In this paper, the side face of an excellent forward tapered shape was formed by efficiently etching the aluminum-based conductive thin film of a low resistance value or a laminated conductively thin film having the aluminum based conductive layer and a molybdenum based layer.
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Abstract: PROBLEM TO BE SOLVED: To form the side face of an excellent forward tapered shape by efficiently etching the aluminum-based conductive thin film of a low resistance value or a laminated conductive thin film having the aluminum-based conductive thin film and a molybdenum-based conductive thin film. SOLUTION: The laminated conductive thin film 15 having the aluminum-based conductive thin film 12 and the molybdenum-based conductive thin films 11 and 13 is brought into contact with the etchant containing (a) phosphorous acid, (b) nitrate, (c) organic acid and (d) water, or the etchant containing nitric acid further. As the nitrate, the ammonium salt of the nitric acid, amine salt, quaternary ammonium salt, or alkali metal salt or the like is used. Also, as the organic acid, formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, maleic acid, fumaric acid, benzoic acid, phthalic acid, trimellitic acid, hydroxyacetic acid, lactic acid, malic acid, tartaric acid, or citric acid or the like is used. COPYRIGHT: (C)2009,JPO&INPIT
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Citations
Patent
Etching solution composition and etching method using the same
Liao Pen-Nan,Liao Po-Hsuan,Chang Shan-Chun,Li Ying-Hao,Lu Chih-Peng +4 more
- 01 Feb 2019
TL;DR: An etching solution composition comprises: based on the total weight of the etch solution composition, 1.0 to 30% of a quaternary ammonium salt, 10 to 60% of amines, and an aqueous medium, such that an approached etching rate and a decrease of the discrepancy at different texture surface can be achieved as mentioned in this paper.
3
Patent
Etching solution composition
Tsuguhiro Tago,Tomotake Matsuda,Mayumi Kimura,Tetsuo Aoyama +3 more
- 16 Jul 2008
TL;DR: In this paper, an aqueous solution containing phosphoric acid, nitric acid and an organic acid salt is used as an etching solution composition for etching a metal film on a substrate.
3
Patent
Etchant composition, method of forming a metal pattern and method of manufacturing a display substrate using the same
Park Hong Sick,Kin Young Jun,Park Yong Woo,Lee Wang Woo,Han Seung Yeon,Seo Won Guk,Shin Hyun Cheol,Kim Gyu Po,Cho Sam Young,Lee Ki Beom +9 more
- 08 Oct 2014
TL;DR: In this article, an etching composition that includes 25-35 wt% of phosphate, 3-9 wt % of nitric acid, 10-20 % of acetic acid, 5-10 % of ammonium nitrate, 6-15 % of sulfonic acid compound, 1-5 % of an amine compound including a carboxyl group, 0.1-1 % of water soluble amino acids, and the remainder consisting of water.
2
Patent
Etchant composition and method for forming metal wiring
Yoshihiro Mukai,喜広 向,Yoshitaka Nishijima,佳孝 西嶋,Hidekuni Yasue,秀国 安江,Satoru Yoshizaki,了 吉崎 +7 more
- 19 Jul 2011
TL;DR: In this paper, the etchant composition for a molybdenum-based metal thin film is presented. But the etch is not suitable for the etching of metal wires, as it has neither odors nor flash points.
1
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Optical semiconductor element and method for manufacturing the same
Akagi Takanobu,Chinone Takako +1 more
- 29 Aug 2013
TL;DR: In this article, the authors proposed a highly reliable optical semiconductor element, which includes a semiconductor laminate (20) having a light-emitting property; an electrode layer (30) which is disposed on the semiconductor Laminate, includes a laminated structure in which first metal layers (32a, 32b) constituted of silver or a silver alloy sandwich a second metal layer (33) therebetween, and has a forward tapered cross-sectional shape as a whole; and a cap layer (50) covering the electrode layer.
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