Patent
End-point detection
David Angell,Carl J. Radens +1 more
- 01 Feb 1993
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TL;DR: In this paper, a wavelength of light is monitored for end-point detection during etching, which characterizes variation of light emitted by discharge produced during the etching process, at least one principal component of the data is calculated, each principal component has variables, each variable has a weight, and each variable corresponds to a wavelength.
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Abstract: A wavelength of light is monitored for end-point detection during etching. Spectral data is collected during etching which characterizes variation of light emitted by discharge produced during etching. At least one principal component of the data is calculated. Each principal component has variables, each variable has a weight, and each variable corresponds to a wavelength of the light emitted by the discharge. By examining or analyzing the weights, it is then determined which variable of the principal component varies during etching such that end-point of the etch can be detected by monitoring the wavelength corresponding to the variable.
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Citations
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Patent
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