Journal Article10.1007/S10854-014-1796-3
Effect of Al concentrations on the electrodeposition and properties of transparent Al-doped ZnO thin films
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TL;DR: In this article, the electrochemical, morphological, structural and optical properties of the zinc oxide (AZO) thin films were investigated in terms of different Al concentration in the starting solution, and it was found that the carrier density of AZO thin films varied between −3.11 and −5.5 at.
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Abstract: Al-doped zinc oxide (AZO) thin films are prepared on polycrystalline fluorine-doped tin oxide-coated conducting glass substrates from nitrates baths by the electrodeposition process at 70 °C. The electrochemical, morphological, structural and optical properties of the AZO thin films were investigated in terms of different Al concentration in the starting solution. It was found that the carrier density of AZO thin films varied between −3.11 and −5.56 × 1020 cm−3 when the Al concentration was between 0 and 5 at.%. Atomic force microscopy images reveal that the concentration of Al has a very significant influence on the surface morphology and roughness of thin AZO. X-ray diffraction spectra demonstrate preferential (002) crystallographic orientation having c-axis perpendicular to the surface of the substrate and average crystallites size of the films was about 33–54 nm. With increasing Al doping, AZO films have a strong improved crystalline quality. As compared to pure ZnO, Al-doped ZnO exhibited lower crystallinity and there is a shift in the (002) diffraction peak to higher angles. Due to the doping of Al of any concentration, the films were found to be showing >80 % transparency. As Al concentration increased the optical band gap was also found to be increase from 3.22 to 3.47 eV. The room-temperature photoluminescence spectra indicated that the introduction of Al can improve the intensity of ultraviolet (UV) emission, thus suggesting its greater prospects in UV optoelectronic devices. A detailed comparison and apprehension of electrochemical, optical and structural properties of ZnO and ZnO:Al thin films is done for the determination of optimum concentration of Al doping.
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Citations
Morphological, Structural and Optical Properties of ZnO Thin Films Deposited by Dip Coating Method
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TL;DR: In this paper, the effect of the thickness of the buffer layer on the properties of the heterojunction was investigated by means of a number of techniques, including Mott-Schottky electrochemical impedance analysis and X-ray diffraction analysis.
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ZnO a multifunctional material: Physical properties, spectroscopic ellipsometry and surface examination
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