Patent
Direct write TM system
Michael J. Renn
- 30 Jan 2002
96
TL;DR: In this paper, an atomizer is used to render a supply of source material into many discrete particles, and a force applicator is employed to push the particles in continuous, parallel streams of discrete particles.
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Abstract: Methods and apparatus for the deposition of a source material ( 10 ) are disclosed. An atomizer ( 12 ) renders a supply of source material ( 10 ) into many discrete particles. A force applicator ( 14 ) propels the particles in continuous, parallel streams of discrete particles. A collimator ( 16 ) controls the direction of flight of the particles in the stream prior to their deposition on a substrate ( 18 ). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
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Citations
Patent
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