Patent
Diffusion barrier layer for mems devices
Hsin-Fu Wang,Ming-Hau Tung,Stephen Zee +2 more
- 06 Nov 2009
50
TL;DR: In this paper, the use of a diffusion barrier layer between metallic layers in MEMS devices is described, which prevents mixing of the two metals, which can alter desired physical characteristics and complicate processing.
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Abstract: Described herein is the use of a diffusion barrier layer between metallic layers in MEMS devices. The diffusion barrier layer prevents mixing of the two metals, which can alter desired physical characteristics and complicate processing. In one example, the diffusion barrier layer may be used as part of a movable reflective structure in interferometric modulators.
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Citations
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Clarence Chui,Jeffrey B. Sampsell,William J. Cummings,Ming-Hau Tung +3 more
- 02 Feb 2005
TL;DR: A spatial light modulator comprises an integrated optical compensation structure, e.g., an optical compensation between a substrate and a plurality of individually addressable light-modulating elements, or an optical compensated structure located on the opposite side of the light modulating elements from the substrate as discussed by the authors.
117
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Microelectromechanical device and method utilizing a porous surface
Teruo Sasagawa,Lior Kogut +1 more
- 12 Apr 2007
TL;DR: In this paper, a microelectromechanical device (MEMS) utilizing a porous electrode surface for reducing stiction is disclosed, in which a transparent electrode having a first surface; and a movable reflective electrode with a second surface facing the first surface.
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Mems structures, methods of fabricating mems components on separate substrates and assembly of same
Jeffrey B. Sampsell,Brian J. Gally,Philip D. Floyd +2 more
- 28 Apr 2008
TL;DR: In this article, a microelectromechanical system (MEMS) device with reduced masking and MEMS devices formed by the same are disclosed, which can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage.
63
Patent
Mems device and interconnects for same
Alan Lewis,Manish Kothari,John Batey,Teruo Sasagawa,Ming-Hau Tung,Gregory D. U'ren,Stephen Zee +6 more
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TL;DR: In this paper, a microelectromechanical system is defined as a device having an electrical interconnect connected to at least one of an electrode and a movable layer within the device.
58
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Nanoparticles having oligonucleotides attached thereto and uses therefor
Chad A. Mirkin,Robert L. Letsinger,Robert C. Mucic,James J. Storhoff,Robert Elghanian,Thomas Andrew Taton +5 more
- 12 Oct 2001
TL;DR: In this paper, a method for detecting a nucleic acid is described. The method comprises contacting the nucleic acids with one or more types of particles having oligonucleotides attached thereto, and a detectable change (preferably a color change) is brought about as a result of the hybridization of the oligon nucleotides on the nanoparticles to the nucleus.
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Etch rates for micromachining processing
TL;DR: The etch rates for 317 combinations of 16 materials (single-crystal silicon, doped, and undoped polysilicon, several types of silicon dioxide, stoichiometric and silicon-rich silicon nitride, aluminum, tungsten, titanium, Ti/W alloy, and two brands of positive photoresist) used in the fabrication of microelectromechanical systems and integrated circuits in 28 wet, plasma, and plasmaless-gas-phase etches (several HF solutions, H/sub 3/PO/sub 4), HNO/sub