Diamond thin films: a 21st-century material

Question

1. What are the contributions mentioned in the paper "Diamond thin films: a 21st-century material" ?

2. What are the advantages of a microwave system over other types of reactors?

3. What is the likely application of diamond in electronics?

4. What is the effect of a positive biased grid on a diamond?

Accepted Answer

In this paper, the authors shall explain the basic science and technology underlying the chemical vapour deposition of diamond thin films, and show how this is leading to the development of diamond as a 21st century engineering material.

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As well as high powers and hence higher growth rates, other advantages of microwave systems over other types of reactors are that they can use a wide variety of gas mixtures, including mixtures with high oxygen content, or ones containing chlorinated or fluorinated gases.

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Diamond can be used to detect other high energy particles, such as alpha- and beta-particles and neutrons), and be used as a replacement for Si in the next generation of particle accelerators (Dischler & Wild 1998; Mainwood et al. 1995).

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The electrons emitted from the surface are accelerated using a positively biased grid to strike a phosphor screen, causing light to be emitted.

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This is because at the high growth temperatures currently used, a substrate will tend to expand, and thus the diamond coating will be grown upon and bonded directly to an expanded substrate.

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occasionally a gas phase CH3 radical can collide and react with the surface site, effectively adding a carbon to the lattice.

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The diamond crystals this produces are used for a wide range of industrial processes, which use the hardness and wear resistance properties of diamond, such as cutting and machining mechanical components, and for polishing and grinding of optics.

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the predominantly thermal nature of the process means that there are very few gas phase ions present, and this reduces the effectiveness of biasing the substrate to improve growth rates or induce oriented growth (see later).

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The surface morphology of the diamond film obtained during CVD depends critically upon the various process conditions, especially the gas mixing ratio, which determines the value for the α-parameter mentioned earlier.

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Since diamond has a similar response to damage by X-rays and gamma-rays as human tissue, a possible application is in medical applications, as a dosimeter for radiation exposure.

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the main drawback of such high power, high rate systems is that the deposition area is limited to the small area struck by the jet (usually ca. 1 cm2).

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a technique known as selective area deposition (SAD) (Chalker & Johnston 1996) can be employed, whereby the diamond is encouraged to grow on only certain parts of the substrate.

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A (2000)Most of the CVD diamond films reported to date have been grown on single-crystal Si wafers, mainly due to the availability, low cost, and favourable properties of Si wafers.

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On the basis of the various field effect transistor devices that have been fabricated, an extremely high power handling density of 30 W mm−1 has been predicted.

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Unlike their major competitors (liquid crystal displays (LCDs)), diamond cold cathode field emission displays (FEDs) would have high brightness, have a large viewing angle, and be insensitive to temperature variations.

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The simplest is abrasion of the substrate surface by mechanical polishing using diamond grit ranging in size from 10 nm to 10 µm.

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The term non-ferrous should be emphasized here, since this highlights one disadvantage that diamond has over other tool materials: it reacts with iron, and so cannot be used to cut ferrous materials such as steel.

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Because of these limitations, welding torches are gradually being replaced by flat-flame burners (Glumac & Goodwin 1993), which are more appropriate for larger-area deposition.

Diamond thin films: a 21st-century material

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Most frequently asked questions

1. What are the contributions mentioned in the paper "Diamond thin films: a 21st-century material" ?

2. What are the advantages of a microwave system over other types of reactors?

3. What is the likely application of diamond in electronics?

4. What is the effect of a positive biased grid on a diamond?

5. Why is the diamond coating grown on a Si wafer?

6. What is the common way to add a carbon to a diamond lattice?

7. What is the common use of graphite in industrial processes?

8. What is the effect of biasing the substrate?

9. What is the morphology of the diamond film obtained during CVD?

10. What is the common application of diamond in medical applications?

11. What is the main drawback of such high power, high rate systems?

12. What is the technique for forming diamond films?

13. Why is the of the CVD diamond films grown on Si wafers?

14. How high is the power handling density of diamond Schottky diodes?

15. What are the advantages of diamond cold cathode emission displays?

16. What is the simplest way to remove the surface of a diamond?

17. What is the disadvantage of diamond over other tool materials?

18. Why are welding torches becoming more appropriate for larger areas?

Figures

Citations

Fabrication and implementation of nanodiamond lateral field emission diode for logic OR function

Investigation of the secondary emission characteristics of CVD diamond films for electron amplification

n-Type CVD diamond: Epitaxy and doping

Study on the Preparation of the Key Materials for High Frequency SAW Devices

A new method for CVD diamond micromachining——Plasma enhanced solid etching

References

Vapor growth of diamond on diamond and other surfaces

Diamond synthesis from gas phase in microwave plasma

Vapor Deposition of Diamond Particles from Methane

Applications of diamond films and related materials

Synthetic Diamond: Emerging CVD Science and Technology

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