Patent
Condensation coating process
Holger Jürgensen,Johannes Kaeppeler,Gerd Strauch,D. Schmitz +3 more
- 09 Aug 2002
74
TL;DR: In this article, a method and device for the production of coated substrates, such as OLEDs, is disclosed, whereby at least one layer is deposited on the substrate, by means of a condensation method and a solid and/or fluid precursor.
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Abstract: A method and device for the production of coated substrates, such as OLEDs is disclosed, whereby at least one layer is deposited on the at least one substrate, by means of a condensation method and a solid and/or fluid precursor and, in particular, at least one sublimate source is used for at least one part of the reaction gases. The invention is characterized in that, by means of a temperature control of the reaction gases between precursor source(s) and substrate, a condensation of the reaction gases before the substrate(s) is avoided.
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Citations
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Tamami Takahashi,Mitsuhiko Shirakashi,Kenya Ito,Kazuyuki Inoue,Kenji Yamaguchi,Masaya Seki +5 more
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TL;DR: In this article, a vessel is supported within a vessel to promote contact of an introduced gas with the vaporizable material and produce a product gas including vaporized material, and a heating element supplies heat to a wall of the vessel to heat vaporizable materials disposed therein.
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TL;DR: In this paper, an integrated deposition system is described that is capable of vaporizing low vapor pressure liquid precursors and conveying the vapor to a processing region to fabricate advanced integrated circuits.
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Solid precursor-based delivery of fluid utilizing controlled solids morphology
John M. Cleary,Jose I. Arno,Bryan C. Hendrix,Donn Naito,Battle Scott L,John N. Gregg,Michael J. Wodjenski,Chongying Xu +7 more
- 31 Aug 2007
TL;DR: In this paper, a method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagents vapor, in which such particle generation and presence is suppressed by structural or processing features of the vapor generation system is presented.
229
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Stephen R. Forrest,Paul E. Burrows,Vladimir S Ban +2 more
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TL;DR: In this paper, the authors present a method for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic pre-agents at a sub-atmospheric pressure.
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Yuichiro Fujikawa,Tatsuo Hatano,Seishi Murakami +2 more
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TL;DR: In this paper, a metal CVD apparatus has a raw gas passage and a reduction gas passage for independently and respectively supplying the raw gas and the reduction gas into a process chamber.
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A high temperature multi-layered alloy heater assembly and related methods
Talex Sajoto,Leonid Selyutin,Jun Zhao,Stefan Wolff +3 more
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TL;DR: In this article, an inner core is brazed to the shell, promoting thermal transfer, and acts as a thermal short between opposing surfaces of the shell to minimize thermal stresses arising from the difference in the thermal expansion coefficients of the various components of the multi-layer heater assembly.
395
Patent
Substrate processing apparatus with bottom-mounted remote plasma system
Gary Fong,Irwin Silvestre +1 more
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Patent
Vaporization and deposition apparatus and process
Sasson Somekh,Jun Zhao,Charles Dornfest,Talex Sajoto,Leonid Selyutin,Vincent Ku,Chris Wang,Frank Chang,Po Tang +8 more
- 03 Sep 1998
TL;DR: In this paper, an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate was proposed, such as a barium, strontium, titanium oxide (BST) film.
173
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