Proceedings Article10.1117/12.396423
Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal
Ann Witvrouw,Bert Du Bois,Piet De Moor,Agnes Verbist,Chris Van Hoof,Hugo Bender,Christiaan Baert +6 more
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TL;DR: In this paper, the etching of different Si-oxide, Si-nitride and metal layers in HF:H2O 24.5:75, BHF:glycerol 2:1 and vapor HF is studied and compared.
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Abstract: In this work the etching of different Si-oxide, Si-nitride and metal layers in HF:H2O 24.5:75.5, BHF:glycerol 2:1 and vapor HF is studied and compared. The vapor HF etching is done in a commercially available system for wafer cleaning, that was adapted according to custom specifications to enable stiction-free surface micro- machining. The etch rates as a function of etching method, time and temperature are determined. Moreover, the influence of internal and external parameters on the HF vapor etching process are analyzed before choosing the standard HF vapor etch technique used for comparing the etching behavior of the different films.
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Citations
Local etch control for fabricating nanomechanical devices
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Vapor Phase Etch Processes for Silicon MEMS
Paul Hammond
- 01 Jan 2015
TL;DR: In this article, the authors focus on two mainstream technologies that are extensively used in both academia and manufacturing, namely vapor HF etching of sacrificial SiO2 and XeF2 etching.
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Patent
Method for enhancing a substrate using gas cluster ion beam processing
John J. Hautala,Nathan E. Baxter,Koji Yamashita +2 more
- 31 Mar 2009
TL;DR: In this paper, a method of enhancing a material layer on a substrate is described, which comprises establishing a gas cluster ion beam (GCIB), and treating a host region of the substrate by exposing the host region to the GCIB.
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Detection of Hydrogen Peroxide Using rGO/PPy Nanocomposites in Silicon Dioxide Trench Embedded Field Effect Transistor
TL;DR: In this paper, a high performance hydrogen peroxide (H2O2) sensing field effect transistor (FET) using reduced graphene oxide - polypyrrole (rGO/PPy) nanocomposites is presented.
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Ultra-High Sensitivity Surface-Micromachined Capacitive Differential Pressure Sensor for Low-Pressure Applications
TL;DR: In this paper , an ultra-high sensitivity surface-micromachined capacitive differential pressure sensor and capacitance bridge readout circuit, with amplitude balancing for differential low-pressure gas measurement applications, was designed, fabricated, and characterized.
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