Proceedings Article10.1109/IEDM.1993.347242
CMOS micromechanical resonator oscillator
Clark T.-C. Nguyen,Roger T. Howe +1 more
- 05 Dec 1993
- pp 199-202
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TL;DR: In this paper, a monolithic high-Q oscillator, fabricated via a combined CMOS plus surface micromachining technology, is described, for which the oscillation frequency is controlled by a polysilicon micromechanical resonator to achieve stability and phase noise performance comparable to those of quartz crystal oscillators.
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Abstract: A completely monolithic high-Q oscillator, fabricated via a combined CMOS plus surface micromachining technology, is described, for which the oscillation frequency is controlled by a polysilicon micromechanical resonator to achieve stability and phase noise performance comparable to those of quartz crystal oscillators. It is shown that the closed-loop, steady-state oscillation amplitude of this oscillator can be controlled through the DC-bias voltage applied to the capacitively driven and sensed /spl mu/resonator. Measurements indicate a phase noise density level of -168 dBm/Hz at 5 kHz offset frequency for an oscillator carrier power of -14.5 dBm. >
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Citations
•Dissertation
Radio frequency signal processing with microelectromechanical resonating systems
Robert Reichenbach
- 28 Jul 2006
Super Sensitive Mass Detection in Nonlinear Regime
Saber Azizi,Iman Ahmadian,Cetin Cetinkaya,Ghader Rezazadeh +3 more
- 04 Apr 2015
TL;DR: In this paper, the nonlinear dynamics of a clamped-clamped micro-beam exposed to a two-sided electrostatic actuation is investigated to determine super sensitive regions for mass detection, where the level of the DC electrostatic voltage is chosen such a way that the system has three equilibrium points including two centers and a saddle node where the homoclinic orbit originates.
A two-chip, 4-MHz, microelectromechanical reference oscillator
Krishnakumar Sundaresan,G.K. Ho,Siavash Pourkamali,Farrokh Ayazi +3 more
- 23 May 2005
TL;DR: The paper describes a 4-MHz temperature compensated reference oscillator based on a capacitive silicon micro-mechanical resonator that is designed to prototype highly stable, low phase-noise reference oscillators integrated at the chip or package level.
Fabrication and characterization of polycrystalline SiC resonators
TL;DR: In this paper, a polycrystalline 3C silicon carbide (polySiC) lateral resonant device is presented, which is fabricated by a three-mask surface micromachining process using silicon dioxide (SiO/sub 2/), polysilicon, and nickel (Ni) as the isolation, sacrificial, and contact metallization layers, respectively.
Micromechanical resonators for oscillators and filters
Clark T.-C. Nguyen
- 07 Nov 1995
TL;DR: In this article, a completely monolithic high-Q oscillator, fabricated via a combined CMOS plus surface micromachining technology, is detailed, for which the oscillation frequency is controlled by a polysilicon micromechanical resonator to achieve high stability.
References
Mechanical-thermal noise in micromachined acoustic and vibration sensors
TL;DR: In this article, several techniques for calculating the mechanical-thermal noise in acoustic and vibration sensors in general, and in micromachined sensors in particular, are reviewed and compared.
855
Phase Noise in Signal Sources
W. P. Robins
- 01 Jan 1984
TL;DR: In this article, a thorough treatment of phase noise, its relationship to thermal noise and associated subjects such as frequency stability is provided, including the design of low-phase noise signal sources, including oscillators and synthesisers.
401
Environmental sensitivities of quartz oscillators
Fred L. Walls,J.-J. Gagnepain +1 more
TL;DR: The physical basis for the sensitivity of precision oscillators to temperature, humidity, pressure, acceleration and vibration, magnetic field, electric field, load, and radiation is examined.
103